Atom lithography of Fe

E. te Sligte, B. Smeets, K.M.R. van der Stam, R.W. Herfst, P. van der Straten, H.C.W. Beijerinck, K.A.H. van Leeuwen

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Abstract

Direct write atom lithography is a technique in which nearly resonant light is used to pattern an atom beam. Nanostructures are formed when the patterned beam falls onto a substrate. We have applied this lithography scheme to a ferromagnetic element, using a 372 nm laser light standing wave to pattern a beam of iron atoms. In this proof-of-principle experiment, we have deposited a grid of 50-nm-wide lines 186 nm apart. These ultraregular, large-scale, ferromagnetic wire arrays may generate exciting new developments in the fields of spintronics and nanomagnetics. (C) 2004 American Institute of Physics.
Original languageEnglish
Pages (from-to)4493-4495
Number of pages3
JournalApplied Physics Letters
Volume85
Issue number19
DOIs
Publication statusPublished - 2004

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