Atom lithography of Fe

E. te Sligte; B. Smeets; K.M.R. van der Stam; R.W. Herfst; P. van der Straten; H.C.W. Beijerinck; K.A.H. van Leeuwen

doi:10.1063/1.1818347

Atom lithography of Fe

E. te Sligte
, B. Smeets
, K.M.R. van der Stam
, R.W. Herfst
, P. van der Straten
, H.C.W. Beijerinck
, K.A.H. van Leeuwen

Research output: Contribution to Journal › Article › Academic › peer-review

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Abstract

Direct write atom lithography is a technique in which nearly resonant light is used to pattern an atom beam. Nanostructures are formed when the patterned beam falls onto a substrate. We have applied this lithography scheme to a ferromagnetic element, using a 372 nm laser light standing wave to pattern a beam of iron atoms. In this proof-of-principle experiment, we have deposited a grid of 50-nm-wide lines 186 nm apart. These ultraregular, large-scale, ferromagnetic wire arrays may generate exciting new developments in the fields of spintronics and nanomagnetics. (C) 2004 American Institute of Physics.

Original language	English
Pages (from-to)	4493-4495
Number of pages	3
Journal	Applied Physics Letters
Volume	85
Issue number	19
DOIs	https://doi.org/10.1063/1.1818347
Publication status	Published - 2004

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title = "Atom lithography of Fe",

abstract = "Direct write atom lithography is a technique in which nearly resonant light is used to pattern an atom beam. Nanostructures are formed when the patterned beam falls onto a substrate. We have applied this lithography scheme to a ferromagnetic element, using a 372 nm laser light standing wave to pattern a beam of iron atoms. In this proof-of-principle experiment, we have deposited a grid of 50-nm-wide lines 186 nm apart. These ultraregular, large-scale, ferromagnetic wire arrays may generate exciting new developments in the fields of spintronics and nanomagnetics. (C) 2004 American Institute of Physics.",

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T1 - Atom lithography of Fe

AU - te Sligte, E.

AU - Smeets, B.

AU - van der Stam, K.M.R.

AU - Herfst, R.W.

AU - van der Straten, P.

AU - Beijerinck, H.C.W.

AU - van Leeuwen, K.A.H.

PY - 2004

Y1 - 2004

N2 - Direct write atom lithography is a technique in which nearly resonant light is used to pattern an atom beam. Nanostructures are formed when the patterned beam falls onto a substrate. We have applied this lithography scheme to a ferromagnetic element, using a 372 nm laser light standing wave to pattern a beam of iron atoms. In this proof-of-principle experiment, we have deposited a grid of 50-nm-wide lines 186 nm apart. These ultraregular, large-scale, ferromagnetic wire arrays may generate exciting new developments in the fields of spintronics and nanomagnetics. (C) 2004 American Institute of Physics.

AB - Direct write atom lithography is a technique in which nearly resonant light is used to pattern an atom beam. Nanostructures are formed when the patterned beam falls onto a substrate. We have applied this lithography scheme to a ferromagnetic element, using a 372 nm laser light standing wave to pattern a beam of iron atoms. In this proof-of-principle experiment, we have deposited a grid of 50-nm-wide lines 186 nm apart. These ultraregular, large-scale, ferromagnetic wire arrays may generate exciting new developments in the fields of spintronics and nanomagnetics. (C) 2004 American Institute of Physics.

U2 - 10.1063/1.1818347

DO - 10.1063/1.1818347

M3 - Article

SN - 0003-6951

VL - 85

SP - 4493

EP - 4495

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 19

ER -

Atom lithography of Fe

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