Barrier-limited surface diffusion in atom lithography

E.T. Sligte; K.M.R. van der Stam; B. Smeets; P. van der Straten; R.E. Scholten; H.C.W. Beijerinck; K.A.H. van Leeuwen

doi:10.1063/1.1638613

Barrier-limited surface diffusion in atom lithography

E.T. Sligte, K.M.R. van der Stam, B. Smeets, P. van der Straten, R.E. Scholten, H.C.W. Beijerinck, K.A.H. van Leeuwen

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Original language	English
Pages (from-to)	1749-1755
Number of pages	7
Journal	Journal of Applied Physics
Volume	95
Issue number	4
DOIs	https://doi.org/10.1063/1.1638613
Publication status	Published - 2004

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title = "Barrier-limited surface diffusion in atom lithography",

author = "E.T. Sligte and {van der Stam}, K.M.R. and B. Smeets and {van der Straten}, P. and R.E. Scholten and H.C.W. Beijerinck and {van Leeuwen}, K.A.H.",

year = "2004",

doi = "10.1063/1.1638613",

language = "English",

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journal = "Journal of Applied Physics",

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TY - JOUR

T1 - Barrier-limited surface diffusion in atom lithography

AU - Sligte, E.T.

AU - van der Stam, K.M.R.

AU - Smeets, B.

AU - van der Straten, P.

AU - Scholten, R.E.

AU - Beijerinck, H.C.W.

AU - van Leeuwen, K.A.H.

PY - 2004

Y1 - 2004

U2 - 10.1063/1.1638613

DO - 10.1063/1.1638613

M3 - Article

SN - 0021-8979

VL - 95

SP - 1749

EP - 1755

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 4

ER -