Abstract
Digital holographic microscopy retrieves amplitude and phase information of an image which allows us to computationally correct for imperfections in the imaging optics. However, digital holographic microscopy is an interferometric technique that is inherently sensitive to undesired phase variations between object and reference beam. These phase variations lower the fringe contrast if they are integrated over a finite exposure time which leads to a reduced amplitude of the retrieved image. This results in significant errors in applications that rely on a stable and accurate amplitude measurement, such as optical overlay metrology in the semiconductor industry. We present experimental results on a computational vibration mitigation method for the application of overlay metrology using phase interpolation between a sequence of measured holograms and demonstrate its capability to improve metrology precision in an overlay metrology application that uses digital holographic microscopy.
Original language | English |
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Pages (from-to) | 36315-36328 |
Number of pages | 14 |
Journal | Optics Express |
Volume | 32 |
Issue number | 21 |
Early online date | 24 Sept 2024 |
DOIs | |
Publication status | Published - 7 Oct 2024 |
Bibliographical note
Publisher Copyright:© 2024 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement.
Funding
Advanced Research Center for Nanolithography, a public-private partnership between the University of Amsterdam (UvA); Vrije Universiteit Amsterdam (VU); Rijksuniversiteit Groningen (RUG); Netherlands Organization for Scientific Research (NWO); ASML, We would like to thank Ivo Klinkert, Jorijn Kuster and Xander Locsin, Jr., all part of the Software Engineering group of AMOLF/ARCNL, for their support and valuable contribution to this project. We also gratefully acknowledge Thomas Detjen and John Ilett of Emergent Vision Technologies for their support, reviewing the camera description in this paper and providing information on the camera specifications.
Funders | Funder number |
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Nederlandse Organisatie voor Wetenschappelijk Onderzoek | |
Universiteit van Amsterdam | |
Physics of Nanolithography | |
AMOLF |