Computational vibration mitigation using phase interpolation in digital holographic microscopy for overlay metrology

Tamar van Gardingen-Cromwijk*, Sander Konijnenberg, Stefan Witte, Johannes F. de Boer, Arie Den Boef

*Corresponding author for this work

Research output: Contribution to JournalArticleAcademicpeer-review

Abstract

Digital holographic microscopy retrieves amplitude and phase information of an image which allows us to computationally correct for imperfections in the imaging optics. However, digital holographic microscopy is an interferometric technique that is inherently sensitive to undesired phase variations between object and reference beam. These phase variations lower the fringe contrast if they are integrated over a finite exposure time which leads to a reduced amplitude of the retrieved image. This results in significant errors in applications that rely on a stable and accurate amplitude measurement, such as optical overlay metrology in the semiconductor industry. We present experimental results on a computational vibration mitigation method for the application of overlay metrology using phase interpolation between a sequence of measured holograms and demonstrate its capability to improve metrology precision in an overlay metrology application that uses digital holographic microscopy.

Original languageEnglish
Pages (from-to)36315-36328
Number of pages14
JournalOptics Express
Volume32
Issue number21
Early online date24 Sept 2024
DOIs
Publication statusPublished - 7 Oct 2024

Bibliographical note

Publisher Copyright:
© 2024 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement.

Funding

Advanced Research Center for Nanolithography, a public-private partnership between the University of Amsterdam (UvA); Vrije Universiteit Amsterdam (VU); Rijksuniversiteit Groningen (RUG); Netherlands Organization for Scientific Research (NWO); ASML, We would like to thank Ivo Klinkert, Jorijn Kuster and Xander Locsin, Jr., all part of the Software Engineering group of AMOLF/ARCNL, for their support and valuable contribution to this project. We also gratefully acknowledge Thomas Detjen and John Ilett of Emergent Vision Technologies for their support, reviewing the camera description in this paper and providing information on the camera specifications.

FundersFunder number
Nederlandse Organisatie voor Wetenschappelijk Onderzoek
Universiteit van Amsterdam
Physics of Nanolithography
AMOLF

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