Cross-calibration of a combined electrostatic and time-of-flight analyzer for energy- and charge-state-resolved spectrometry of tin laser-produced plasma

L. Poirier, A. Bayerle, A. Lassise, F. Torretti, R. Schupp, L. Behnke, Y. Mostafa, W. Ubachs, O. O. Versolato*, R. Hoekstra

*Corresponding author for this work

Research output: Contribution to JournalArticleAcademicpeer-review

Abstract

We present the results of the calibration of a channeltron-based electrostatic analyzer operating in time-of-flight mode (ESA-ToF) using tin ions resulting from laser-produced plasma, over a wide range of charge states and energies. Specifically, the channeltron electron multiplier detection efficiency and the spectrometer resolution are calibrated, and count rate effects are characterized. With the obtained overall response function, the ESA-ToF is shown to accurately reproduce charge-integrated measurements separately and simultaneously obtained from a Faraday cup (FC), up to a constant factor the finding of which enables absolute cross-calibration of the ESA-ToF using the FC as an absolute benchmark. Absolute charge-state-resolved ion energy distributions are obtained from ns-pulse Nd:YAG-laser-produced microdroplet tin plasmas in a setting relevant for state-of-the-art extreme ultraviolet nanolithography.

Original languageEnglish
Article number39
Pages (from-to)1-11
Number of pages11
JournalApplied Physics B: Lasers and Optics
Volume128
Issue number3
Early online date5 Feb 2022
DOIs
Publication statusPublished - Mar 2022

Bibliographical note

Funding Information:
This project has received funding from European Reserach Council (ERC) Starting Grant number 802648. This publication is part of the project New Light for Nanolithography (with Project number 15697) of the research programme VIDI which is (partly) financed by the Dutch Research Council.

Funding Information:
The authors thank Duncan Verheijde for his support in understanding and improving the ESA-ToF electronics. They also thank Jorijn Kuster for designing efficient and user-friendly software interfaces for our experimental setups. This work has been carried out at the Advanced Research Center for Nanolithography (ARCNL), a public-private partnership of the University of Amsterdam (UvA), the Vrije Universiteit Amsterdam, the Dutch Research Council (NWO) and the semiconductor equipment manufacturer ASML.

Publisher Copyright:
© 2022, The Author(s).

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