Dependence of ion charge-energy emission from Nd:YAG-laser-produced plasma on laser intensity in the 0.4 - 40 × 10 10 W/cm2 range

Lucas Poirier; Adam Lassise; Ronnie Hoekstra; John Sheil; Oscar O. Versolato

doi:10.1063/5.0150883

Dependence of ion charge-energy emission from Nd:YAG-laser-produced plasma on laser intensity in the 0.4 - 40 × 10 10 W/cm² range

Lucas Poirier
, Adam Lassise
, Ronnie Hoekstra
, John Sheil
, Oscar O. Versolato^*

^*Corresponding author for this work

Research output: Contribution to Journal › Article › Academic › peer-review

Abstract

We experimentally characterize the ionic emission, including the individual charge states Sn^z+ ( z = 1 , … , 8 ), from laser-produced tin plasma as a function of the intensity of the employed ns-pulsed laser. The plasma is generated in a vacuum from tin microdroplets (diameter ranging from 17 to 35 μm) using pulsed Nd:YAG laser light (laser wavelength λ = 1.064 μm) over a range of intensities (0.4- 40 × 10 10 W/cm²). We measure charge-state-resolved and integrated ion energy distributions at seven angular positions around the plasma using seven retarding field analyzers. We highlight peak features in both types of spectra and describe the dependence of their energies on laser intensity with power-law functions. The resulting power laws match those derived from plasma radiation hydrodynamics theory. The analytical scaling laws exhibit strong isotropy, while the ion energy spectra are highly anisotropic.

Original language	English
Article number	083505
Pages (from-to)	1-9
Number of pages	9
Journal	Physics of Plasmas
Volume	30
Issue number	8
Early online date	3 Aug 2023
DOIs	https://doi.org/10.1063/5.0150883
Publication status	Published - Aug 2023

Bibliographical note

Funding Information:
The authors thank Duncan Verheijde for his support in understanding and improving the RFA electronics. They also thank Jorijn Kuster for the indispensable software support of our experimental setups. This work has been carried out at the Advanced Research Center for Nanolithography (ARCNL). ARCNL is public–private partnership with founding partners UvA, VU, NWO-I, and ASML, and associate partner RUG. This project has received funding from European Research Council (ERC) Starting Grant No. 802648. This publication is part of the project New Light for Nanolithography (with Project No. 15697) of the research program VIDI, which is (partly) financed by the Dutch Research Council. This work made use of the Dutch National e-Infrastructure with the support of the SURF Cooperative using Grant No. EINF-2947.

Funding Information:
The authors thank Duncan Verheijde for his support in understanding and improving the RFA electronics. They also thank Jorijn Kuster for the indispensable software support of our experimental setups. This work has been carried out at the Advanced Research Center for Nanolithography (ARCNL). ARCNL is public-private partnership with founding partners UvA, VU, NWO-I, and ASML, and associate partner RUG. This project has received funding from European Research Council (ERC) Starting Grant No. 802648. This publication is part of the project New Light for Nanolithography (with Project No. 15697) of the research program VIDI, which is (partly) financed by the Dutch Research Council. This work made use of the Dutch National e-Infrastructure with the support of the SURF Cooperative using Grant No. EINF-2947.

Publisher Copyright:
© 2023 Author(s).

Funding

The authors thank Duncan Verheijde for his support in understanding and improving the RFA electronics. They also thank Jorijn Kuster for the indispensable software support of our experimental setups. This work has been carried out at the Advanced Research Center for Nanolithography (ARCNL). ARCNL is public–private partnership with founding partners UvA, VU, NWO-I, and ASML, and associate partner RUG. This project has received funding from European Research Council (ERC) Starting Grant No. 802648. This publication is part of the project New Light for Nanolithography (with Project No. 15697) of the research program VIDI, which is (partly) financed by the Dutch Research Council. This work made use of the Dutch National e-Infrastructure with the support of the SURF Cooperative using Grant No. EINF-2947. The authors thank Duncan Verheijde for his support in understanding and improving the RFA electronics. They also thank Jorijn Kuster for the indispensable software support of our experimental setups. This work has been carried out at the Advanced Research Center for Nanolithography (ARCNL). ARCNL is public-private partnership with founding partners UvA, VU, NWO-I, and ASML, and associate partner RUG. This project has received funding from European Research Council (ERC) Starting Grant No. 802648. This publication is part of the project New Light for Nanolithography (with Project No. 15697) of the research program VIDI, which is (partly) financed by the Dutch Research Council. This work made use of the Dutch National e-Infrastructure with the support of the SURF Cooperative using Grant No. EINF-2947.

Funders	Funder number
NWO-I
ASML
European Research Council
Horizon 2020 Framework Programme	802648
???publication-publication-funding-organisation-not-added???	15697
SURF	EINF-2947

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Cite this

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title = "Dependence of ion charge-energy emission from Nd:YAG-laser-produced plasma on laser intensity in the 0.4 - 40 × 10 10 W/cm2 range",

abstract = "We experimentally characterize the ionic emission, including the individual charge states Snz+ ( z = 1 , … , 8 ), from laser-produced tin plasma as a function of the intensity of the employed ns-pulsed laser. The plasma is generated in a vacuum from tin microdroplets (diameter ranging from 17 to 35 μm) using pulsed Nd:YAG laser light (laser wavelength λ = 1.064 μm) over a range of intensities (0.4- 40 × 10 10 W/cm2). We measure charge-state-resolved and integrated ion energy distributions at seven angular positions around the plasma using seven retarding field analyzers. We highlight peak features in both types of spectra and describe the dependence of their energies on laser intensity with power-law functions. The resulting power laws match those derived from plasma radiation hydrodynamics theory. The analytical scaling laws exhibit strong isotropy, while the ion energy spectra are highly anisotropic.",

author = "Lucas Poirier and Adam Lassise and Ronnie Hoekstra and John Sheil and Versolato, \{Oscar O.\}",

note = "Funding Information: The authors thank Duncan Verheijde for his support in understanding and improving the RFA electronics. They also thank Jorijn Kuster for the indispensable software support of our experimental setups. This work has been carried out at the Advanced Research Center for Nanolithography (ARCNL). ARCNL is public–private partnership with founding partners UvA, VU, NWO-I, and ASML, and associate partner RUG. This project has received funding from European Research Council (ERC) Starting Grant No. 802648. This publication is part of the project New Light for Nanolithography (with Project No. 15697) of the research program VIDI, which is (partly) financed by the Dutch Research Council. This work made use of the Dutch National e-Infrastructure with the support of the SURF Cooperative using Grant No. EINF-2947. Funding Information: The authors thank Duncan Verheijde for his support in understanding and improving the RFA electronics. They also thank Jorijn Kuster for the indispensable software support of our experimental setups. This work has been carried out at the Advanced Research Center for Nanolithography (ARCNL). ARCNL is public-private partnership with founding partners UvA, VU, NWO-I, and ASML, and associate partner RUG. This project has received funding from European Research Council (ERC) Starting Grant No. 802648. This publication is part of the project New Light for Nanolithography (with Project No. 15697) of the research program VIDI, which is (partly) financed by the Dutch Research Council. This work made use of the Dutch National e-Infrastructure with the support of the SURF Cooperative using Grant No. EINF-2947. Publisher Copyright: {\textcopyright} 2023 Author(s).",

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AU - Sheil, John

AU - Versolato, Oscar O.

N1 - Funding Information: The authors thank Duncan Verheijde for his support in understanding and improving the RFA electronics. They also thank Jorijn Kuster for the indispensable software support of our experimental setups. This work has been carried out at the Advanced Research Center for Nanolithography (ARCNL). ARCNL is public–private partnership with founding partners UvA, VU, NWO-I, and ASML, and associate partner RUG. This project has received funding from European Research Council (ERC) Starting Grant No. 802648. This publication is part of the project New Light for Nanolithography (with Project No. 15697) of the research program VIDI, which is (partly) financed by the Dutch Research Council. This work made use of the Dutch National e-Infrastructure with the support of the SURF Cooperative using Grant No. EINF-2947. Funding Information: The authors thank Duncan Verheijde for his support in understanding and improving the RFA electronics. They also thank Jorijn Kuster for the indispensable software support of our experimental setups. This work has been carried out at the Advanced Research Center for Nanolithography (ARCNL). ARCNL is public-private partnership with founding partners UvA, VU, NWO-I, and ASML, and associate partner RUG. This project has received funding from European Research Council (ERC) Starting Grant No. 802648. This publication is part of the project New Light for Nanolithography (with Project No. 15697) of the research program VIDI, which is (partly) financed by the Dutch Research Council. This work made use of the Dutch National e-Infrastructure with the support of the SURF Cooperative using Grant No. EINF-2947. Publisher Copyright: © 2023 Author(s).

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N2 - We experimentally characterize the ionic emission, including the individual charge states Snz+ ( z = 1 , … , 8 ), from laser-produced tin plasma as a function of the intensity of the employed ns-pulsed laser. The plasma is generated in a vacuum from tin microdroplets (diameter ranging from 17 to 35 μm) using pulsed Nd:YAG laser light (laser wavelength λ = 1.064 μm) over a range of intensities (0.4- 40 × 10 10 W/cm2). We measure charge-state-resolved and integrated ion energy distributions at seven angular positions around the plasma using seven retarding field analyzers. We highlight peak features in both types of spectra and describe the dependence of their energies on laser intensity with power-law functions. The resulting power laws match those derived from plasma radiation hydrodynamics theory. The analytical scaling laws exhibit strong isotropy, while the ion energy spectra are highly anisotropic.

AB - We experimentally characterize the ionic emission, including the individual charge states Snz+ ( z = 1 , … , 8 ), from laser-produced tin plasma as a function of the intensity of the employed ns-pulsed laser. The plasma is generated in a vacuum from tin microdroplets (diameter ranging from 17 to 35 μm) using pulsed Nd:YAG laser light (laser wavelength λ = 1.064 μm) over a range of intensities (0.4- 40 × 10 10 W/cm2). We measure charge-state-resolved and integrated ion energy distributions at seven angular positions around the plasma using seven retarding field analyzers. We highlight peak features in both types of spectra and describe the dependence of their energies on laser intensity with power-law functions. The resulting power laws match those derived from plasma radiation hydrodynamics theory. The analytical scaling laws exhibit strong isotropy, while the ion energy spectra are highly anisotropic.

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