Digital image correction methods using dark-field digital holographic microscopy for semiconductor metrology

Manashee Adhikary; Tamar Cromwijk; Sander Konijnenberg; Wim Coene; Stefan Witte; Johannes de Boer; Arie den Boef

doi:10.1364/COSI.2023.CM3B.5

Digital image correction methods using dark-field digital holographic microscopy for semiconductor metrology

Manashee Adhikary^*, Tamar Cromwijk, Sander Konijnenberg, Wim Coene, Stefan Witte, Johannes de Boer, Arie den Boef

^*Corresponding author for this work

Research output: Chapter in Book / Report / Conference proceeding › Conference contribution › Academic › peer-review

Abstract

In semiconductor fabrication industry, the demand for faster and more reliable optical metrology systems increases with the continued shrinking of feature sizes in integrated circuits. We present digital holographic microscopy for diffraction-based overlay metrology that opens new possibilities to image small metrology targets with weak diffraction efficiencies using simple optics, and digitally correct experimental imperfections.

Original language	English
Title of host publication	Proceedings Optica Imaging Congress (3D, COSI, DH, FLatOptics, IS, pcAOP)
Publisher	Optica Publishing Group (formerly OSA)
ISBN (Electronic)	9781957171289
DOIs	https://doi.org/10.1364/COSI.2023.CM3B.5
Publication status	Published - 2023
Event	2023 Computational Optical Sensing and Imaging, COSI 2023 in Optica Imaging Congress - Part of Imaging and Applied Optics Congress 2023 - Boston, United States Duration: 14 Aug 2023 → 17 Aug 2023

Conference

Conference	2023 Computational Optical Sensing and Imaging, COSI 2023 in Optica Imaging Congress - Part of Imaging and Applied Optics Congress 2023
Country/Territory	United States
City	Boston
Period	14/08/23 → 17/08/23

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© 2023 The Author(s).

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10.1364/COSI.2023.CM3B.5

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Adhikary, M., Cromwijk, T., Konijnenberg, S., Coene, W., Witte, S., de Boer, J., & den Boef, A. (2023). Digital image correction methods using dark-field digital holographic microscopy for semiconductor metrology. In Proceedings Optica Imaging Congress (3D, COSI, DH, FLatOptics, IS, pcAOP) Optica Publishing Group (formerly OSA). https://doi.org/10.1364/COSI.2023.CM3B.5

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title = "Digital image correction methods using dark-field digital holographic microscopy for semiconductor metrology",

abstract = "In semiconductor fabrication industry, the demand for faster and more reliable optical metrology systems increases with the continued shrinking of feature sizes in integrated circuits. We present digital holographic microscopy for diffraction-based overlay metrology that opens new possibilities to image small metrology targets with weak diffraction efficiencies using simple optics, and digitally correct experimental imperfections.",

author = "Manashee Adhikary and Tamar Cromwijk and Sander Konijnenberg and Wim Coene and Stefan Witte and {de Boer}, Johannes and {den Boef}, Arie",

note = "Publisher Copyright: {\textcopyright} 2023 The Author(s).; 2023 Computational Optical Sensing and Imaging, COSI 2023 in Optica Imaging Congress - Part of Imaging and Applied Optics Congress 2023 ; Conference date: 14-08-2023 Through 17-08-2023",

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Adhikary, M, Cromwijk, T, Konijnenberg, S, Coene, W, Witte, S , de Boer, J & den Boef, A 2023, Digital image correction methods using dark-field digital holographic microscopy for semiconductor metrology. in Proceedings Optica Imaging Congress (3D, COSI, DH, FLatOptics, IS, pcAOP). Optica Publishing Group (formerly OSA), 2023 Computational Optical Sensing and Imaging, COSI 2023 in Optica Imaging Congress - Part of Imaging and Applied Optics Congress 2023, Boston, United States, 14/08/23. https://doi.org/10.1364/COSI.2023.CM3B.5

Digital image correction methods using dark-field digital holographic microscopy for semiconductor metrology. / Adhikary, Manashee; Cromwijk, Tamar; Konijnenberg, Sander et al.
Proceedings Optica Imaging Congress (3D, COSI, DH, FLatOptics, IS, pcAOP). Optica Publishing Group (formerly OSA), 2023.

Research output: Chapter in Book / Report / Conference proceeding › Conference contribution › Academic › peer-review

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T1 - Digital image correction methods using dark-field digital holographic microscopy for semiconductor metrology

AU - Adhikary, Manashee

AU - Cromwijk, Tamar

AU - Konijnenberg, Sander

AU - Coene, Wim

AU - Witte, Stefan

AU - de Boer, Johannes

AU - den Boef, Arie

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AB - In semiconductor fabrication industry, the demand for faster and more reliable optical metrology systems increases with the continued shrinking of feature sizes in integrated circuits. We present digital holographic microscopy for diffraction-based overlay metrology that opens new possibilities to image small metrology targets with weak diffraction efficiencies using simple optics, and digitally correct experimental imperfections.

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BT - Proceedings Optica Imaging Congress (3D, COSI, DH, FLatOptics, IS, pcAOP)

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Y2 - 14 August 2023 through 17 August 2023

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Digital image correction methods using dark-field digital holographic microscopy for semiconductor metrology

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