Divergence and efficiency optimization in polarization-controlled two-color high-harmonic generation

Sylvianne D.C. Roscam Abbing; Filippo Campi; Alexandra Zeltsi; Peter Smorenburg; Peter M. Kraus

doi:10.1038/s41598-021-03657-2

Divergence and efficiency optimization in polarization-controlled two-color high-harmonic generation

Sylvianne D.C. Roscam Abbing^*, Filippo Campi, Alexandra Zeltsi, Peter Smorenburg, Peter M. Kraus

^*Corresponding author for this work

Research output: Contribution to Journal › Article › Academic › peer-review

Abstract

Improving the brightness of high-harmonic generation (HHG) sources is one of the major goals for next-generation ultrafast, imaging and metrology applications in the extreme-ultraviolet spectrum. Previous research efforts have demonstrated a plethora of techniques to increase the conversion efficiency of HHG. However, few studies so far have addressed how to simultaneously minimize the divergence and improve focusability, which all contribute to an increased brightness of the source. Here, we investigate how to improve both photon yield and divergence, which is directly linked to focusability, when adding the second harmonic to the fundamental driving field. We study the effects of the relative polarization in two-color HHG and compare the results to a one-color configuration. In a perpendicular two-color field, the relative phase between the two colors can be used to suppress or enhance recombination of either the long or the short trajectories. This allows to exert control over the divergence of the harmonics. In a parallel two-color field, the ionization rate is modified through the two-color phase, which selects trajectories during the ionization step. This enhances the total yield. We elaborate on the underlying mechanisms for parallel, perpendicular, and intermediate polarization angles, and confirm our experimental observations with simulations.

Original language	English
Article number	24253
Pages (from-to)	1-11
Number of pages	11
Journal	Scientific Reports
Volume	11
DOIs	https://doi.org/10.1038/s41598-021-03657-2
Publication status	Published - 20 Dec 2021

Bibliographical note

Funding Information:
This work was carried out at the Advanced Research Center for Nanolithography (ARCNL), a public-private partnership of the University of Amsterdam (UvA), the Vrije Universiteit Amsterdam (VU), the Netherlands Organisation for Scientific Research (NWO), and the semiconductor equipment manufacturer ASML, and was partly financed by ‘Toeslag voor Topconsortia voor Kennis en Innovatie (TKI)’ from the Dutch Ministry of Economic Affairs and Climate Policy. We thank Reinout Jaarsma for technical support. We thank the mechanical workshop and the design, electronic, and software departments of ARCNL for the construction of the setup. P.M.K. acknowledges support from NWO Veni grant 016.Veni.192.254.

Publisher Copyright:
© 2021, The Author(s).

Funding

This work was carried out at the Advanced Research Center for Nanolithography (ARCNL), a public-private partnership of the University of Amsterdam (UvA), the Vrije Universiteit Amsterdam (VU), the Netherlands Organisation for Scientific Research (NWO), and the semiconductor equipment manufacturer ASML, and was partly financed by ‘Toeslag voor Topconsortia voor Kennis en Innovatie (TKI)’ from the Dutch Ministry of Economic Affairs and Climate Policy. We thank Reinout Jaarsma for technical support. We thank the mechanical workshop and the design, electronic, and software departments of ARCNL for the construction of the setup. P.M.K. acknowledges support from NWO Veni grant 016.Veni.192.254.

Funders	Funder number
Toeslag voor Topconsortia voor Kennis en Innovatie
Universiteit van Amsterdam
Nederlandse Organisatie voor Wetenschappelijk Onderzoek	016.Veni.192.254
Nederlandse Organisatie voor Wetenschappelijk Onderzoek
Ministerie van Economische Zaken en Klimaat

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

Access to Document

10.1038/s41598-021-03657-2

Persistent URL (handle)

Copy link address

Cite this

@article{c5cc420de5414b4ea2a418c7926e0918,

title = "Divergence and efficiency optimization in polarization-controlled two-color high-harmonic generation",

abstract = "Improving the brightness of high-harmonic generation (HHG) sources is one of the major goals for next-generation ultrafast, imaging and metrology applications in the extreme-ultraviolet spectrum. Previous research efforts have demonstrated a plethora of techniques to increase the conversion efficiency of HHG. However, few studies so far have addressed how to simultaneously minimize the divergence and improve focusability, which all contribute to an increased brightness of the source. Here, we investigate how to improve both photon yield and divergence, which is directly linked to focusability, when adding the second harmonic to the fundamental driving field. We study the effects of the relative polarization in two-color HHG and compare the results to a one-color configuration. In a perpendicular two-color field, the relative phase between the two colors can be used to suppress or enhance recombination of either the long or the short trajectories. This allows to exert control over the divergence of the harmonics. In a parallel two-color field, the ionization rate is modified through the two-color phase, which selects trajectories during the ionization step. This enhances the total yield. We elaborate on the underlying mechanisms for parallel, perpendicular, and intermediate polarization angles, and confirm our experimental observations with simulations.",

author = "{Roscam Abbing}, {Sylvianne D.C.} and Filippo Campi and Alexandra Zeltsi and Peter Smorenburg and Kraus, {Peter M.}",

note = "Funding Information: This work was carried out at the Advanced Research Center for Nanolithography (ARCNL), a public-private partnership of the University of Amsterdam (UvA), the Vrije Universiteit Amsterdam (VU), the Netherlands Organisation for Scientific Research (NWO), and the semiconductor equipment manufacturer ASML, and was partly financed by {\textquoteleft}Toeslag voor Topconsortia voor Kennis en Innovatie (TKI){\textquoteright} from the Dutch Ministry of Economic Affairs and Climate Policy. We thank Reinout Jaarsma for technical support. We thank the mechanical workshop and the design, electronic, and software departments of ARCNL for the construction of the setup. P.M.K. acknowledges support from NWO Veni grant 016.Veni.192.254. Publisher Copyright: {\textcopyright} 2021, The Author(s).",

year = "2021",

month = dec,

day = "20",

doi = "10.1038/s41598-021-03657-2",

language = "English",

volume = "11",

pages = "1--11",

journal = "Scientific Reports",

issn = "2045-2322",

publisher = "Nature Publishing Group",

}

TY - JOUR

T1 - Divergence and efficiency optimization in polarization-controlled two-color high-harmonic generation

AU - Roscam Abbing, Sylvianne D.C.

AU - Campi, Filippo

AU - Zeltsi, Alexandra

AU - Smorenburg, Peter

AU - Kraus, Peter M.

N1 - Funding Information: This work was carried out at the Advanced Research Center for Nanolithography (ARCNL), a public-private partnership of the University of Amsterdam (UvA), the Vrije Universiteit Amsterdam (VU), the Netherlands Organisation for Scientific Research (NWO), and the semiconductor equipment manufacturer ASML, and was partly financed by ‘Toeslag voor Topconsortia voor Kennis en Innovatie (TKI)’ from the Dutch Ministry of Economic Affairs and Climate Policy. We thank Reinout Jaarsma for technical support. We thank the mechanical workshop and the design, electronic, and software departments of ARCNL for the construction of the setup. P.M.K. acknowledges support from NWO Veni grant 016.Veni.192.254. Publisher Copyright: © 2021, The Author(s).

PY - 2021/12/20

Y1 - 2021/12/20

N2 - Improving the brightness of high-harmonic generation (HHG) sources is one of the major goals for next-generation ultrafast, imaging and metrology applications in the extreme-ultraviolet spectrum. Previous research efforts have demonstrated a plethora of techniques to increase the conversion efficiency of HHG. However, few studies so far have addressed how to simultaneously minimize the divergence and improve focusability, which all contribute to an increased brightness of the source. Here, we investigate how to improve both photon yield and divergence, which is directly linked to focusability, when adding the second harmonic to the fundamental driving field. We study the effects of the relative polarization in two-color HHG and compare the results to a one-color configuration. In a perpendicular two-color field, the relative phase between the two colors can be used to suppress or enhance recombination of either the long or the short trajectories. This allows to exert control over the divergence of the harmonics. In a parallel two-color field, the ionization rate is modified through the two-color phase, which selects trajectories during the ionization step. This enhances the total yield. We elaborate on the underlying mechanisms for parallel, perpendicular, and intermediate polarization angles, and confirm our experimental observations with simulations.

AB - Improving the brightness of high-harmonic generation (HHG) sources is one of the major goals for next-generation ultrafast, imaging and metrology applications in the extreme-ultraviolet spectrum. Previous research efforts have demonstrated a plethora of techniques to increase the conversion efficiency of HHG. However, few studies so far have addressed how to simultaneously minimize the divergence and improve focusability, which all contribute to an increased brightness of the source. Here, we investigate how to improve both photon yield and divergence, which is directly linked to focusability, when adding the second harmonic to the fundamental driving field. We study the effects of the relative polarization in two-color HHG and compare the results to a one-color configuration. In a perpendicular two-color field, the relative phase between the two colors can be used to suppress or enhance recombination of either the long or the short trajectories. This allows to exert control over the divergence of the harmonics. In a parallel two-color field, the ionization rate is modified through the two-color phase, which selects trajectories during the ionization step. This enhances the total yield. We elaborate on the underlying mechanisms for parallel, perpendicular, and intermediate polarization angles, and confirm our experimental observations with simulations.

UR - http://www.scopus.com/inward/record.url?scp=85121526782&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85121526782&partnerID=8YFLogxK

U2 - 10.1038/s41598-021-03657-2

DO - 10.1038/s41598-021-03657-2

M3 - Article

AN - SCOPUS:85121526782

SN - 2045-2322

VL - 11

SP - 1

EP - 11

JO - Scientific Reports

JF - Scientific Reports

M1 - 24253

ER -

Divergence and efficiency optimization in polarization-controlled two-color high-harmonic generation

Abstract

Bibliographical note

Funding

UN SDGs

Access to Document

Persistent URL (handle)

Other files and links

Fingerprint

Cite this