Effects of developer exhaustion on the sensitometric properties of four dental films

K. Syriopoulos, X.L. Velders, G.C.H. Sanderink, F.C. van Ginkel, P.F. van der Stelt

    Research output: Contribution to JournalArticleAcademicpeer-review

    Original languageUndefined/Unknown
    Pages (from-to)80-88
    JournalDentomaxillofacial Radiology
    Volume28
    DOIs
    Publication statusPublished - 1999

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