Evidence of production of keV Sn+ ions in the H2 buffer gas surrounding an Sn-plasma EUV source

S. Rai; K. I. Bijlsma; L. Poirier; E. de Wit; L. Assink; A. Lassise; I. Rabadán; L. Méndez; J. Sheil; O. O. Versolato; R. Hoekstra

doi:10.1088/1361-6595/acc274

Evidence of production of keV Sn⁺ ions in the H₂ buffer gas surrounding an Sn-plasma EUV source

S. Rai, K. I. Bijlsma, L. Poirier, E. de Wit, L. Assink, A. Lassise, I. Rabadán, L. Méndez, J. Sheil, O. O. Versolato, R. Hoekstra^*

^*Corresponding author for this work

Research output: Contribution to Journal › Article › Academic › peer-review

Abstract

Charge-state-resolved kinetic energy spectra of Sn ions ejected from a laser-produced plasma (LPP) of Sn have been measured at different densities of the H₂ buffer gas surrounding a micro-droplet LPP. In the absence of H₂, energetic keV Sn ions with charge states ranging from 4+ to 8+ are measured. For the H₂ densities used in the experiments no appreciable stopping or energy loss of the ions is observed. However, electron capture by Sn ions from H₂ results in a rapid shift toward lower charge states. At the highest H₂ pressure of 6 × 10 − 4 mbar, only Sn²⁺ and Sn⁺ ions are measured. The occurrence of Sn⁺ ions is remarkable due to the endothermic nature of electron capture by Sn²⁺ ions from H₂. To explain the production of keV Sn⁺ ions, it is proposed that their generation is due to electron capture by metastable Sn 2 + ∗ ions. The gateway role of metastable Sn 2 + ∗ is underpinned by model simulations using atomic collision cross sections to track the charge states of Sn ions while traversing the H₂ buffer gas.

Original language	English
Article number	035006
Pages (from-to)	1-8
Number of pages	8
Journal	Plasma Sources Science and Technology
Volume	32
Issue number	3
Early online date	23 Mar 2023
DOIs	https://doi.org/10.1088/1361-6595/acc274
Publication status	Published - Mar 2023

Bibliographical note

Funding Information:
This work is part of the research portfolio of the Advanced Research Center for Nanolithography (ARCNL), a public-private partnership between the University of Amsterdam (UvA), the Vrije Universiteit Amsterdam (VU), the University of Groningen (RuG), the Netherlands Organization for Scientific Research (NWO), and the semiconductor equipment manufacturer ASML. The project is co-financed by Holland High Tech with PPS allowance for research and development in the top sector HTSM. The theoretical work of I R and L M was partially supported by Ministerio de Economía and Competitividad (Spain), Project No. FIS2017-84684-R. The computational support by the Centro de Computación Científica of UAM is also acknowledged.

Publisher Copyright:
© 2023 The Author(s). Published by IOP Publishing Ltd.

Funding

This work is part of the research portfolio of the Advanced Research Center for Nanolithography (ARCNL), a public-private partnership between the University of Amsterdam (UvA), the Vrije Universiteit Amsterdam (VU), the University of Groningen (RuG), the Netherlands Organization for Scientific Research (NWO), and the semiconductor equipment manufacturer ASML. The project is co-financed by Holland High Tech with PPS allowance for research and development in the top sector HTSM. The theoretical work of I R and L M was partially supported by Ministerio de Economía and Competitividad (Spain), Project No. FIS2017-84684-R. The computational support by the Centro de Computación Científica of UAM is also acknowledged.

Funders	Funder number
Nederlandse Organisatie voor Wetenschappelijk Onderzoek
Centro de Computación Científica
Rijksuniversiteit Groningen
Universiteit van Amsterdam
Not added	802648
Ministerio de Economía y Competitividad	FIS2017-84684-R

Keywords

charge exchange
EUV source
ion-atom collisions
laser-produced plasma

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

Access to Document

10.1088/1361-6595/acc274Licence: CC BY

Persistent URL (handle)

Persistent link

Cite this

@article{f73a08bcbc0f426c9260a1367ff35d90,

title = "Evidence of production of keV Sn+ ions in the H2 buffer gas surrounding an Sn-plasma EUV source",

abstract = "Charge-state-resolved kinetic energy spectra of Sn ions ejected from a laser-produced plasma (LPP) of Sn have been measured at different densities of the H2 buffer gas surrounding a micro-droplet LPP. In the absence of H2, energetic keV Sn ions with charge states ranging from 4+ to 8+ are measured. For the H2 densities used in the experiments no appreciable stopping or energy loss of the ions is observed. However, electron capture by Sn ions from H2 results in a rapid shift toward lower charge states. At the highest H2 pressure of 6 × 10 − 4 mbar, only Sn2+ and Sn+ ions are measured. The occurrence of Sn+ ions is remarkable due to the endothermic nature of electron capture by Sn2+ ions from H2. To explain the production of keV Sn+ ions, it is proposed that their generation is due to electron capture by metastable Sn 2 + ∗ ions. The gateway role of metastable Sn 2 + ∗ is underpinned by model simulations using atomic collision cross sections to track the charge states of Sn ions while traversing the H2 buffer gas.",

keywords = "charge exchange, EUV source, ion-atom collisions, laser-produced plasma",

author = "S. Rai and Bijlsma, \{K. I.\} and L. Poirier and \{de Wit\}, E. and L. Assink and A. Lassise and I. Rabad{\'a}n and L. M{\'e}ndez and J. Sheil and Versolato, \{O. O.\} and R. Hoekstra",

note = "Funding Information: This work is part of the research portfolio of the Advanced Research Center for Nanolithography (ARCNL), a public-private partnership between the University of Amsterdam (UvA), the Vrije Universiteit Amsterdam (VU), the University of Groningen (RuG), the Netherlands Organization for Scientific Research (NWO), and the semiconductor equipment manufacturer ASML. The project is co-financed by Holland High Tech with PPS allowance for research and development in the top sector HTSM. The theoretical work of I R and L M was partially supported by Ministerio de Econom{\'i}a and Competitividad (Spain), Project No. FIS2017-84684-R. The computational support by the Centro de Computaci{\'o}n Cient{\'i}fica of UAM is also acknowledged. Publisher Copyright: {\textcopyright} 2023 The Author(s). Published by IOP Publishing Ltd.",

year = "2023",

month = mar,

doi = "10.1088/1361-6595/acc274",

language = "English",

volume = "32",

pages = "1--8",

journal = "Plasma Sources Science and Technology",

issn = "0963-0252",

publisher = "IOP Publishing Ltd.",

number = "3",

}

TY - JOUR

T1 - Evidence of production of keV Sn+ ions in the H2 buffer gas surrounding an Sn-plasma EUV source

AU - Rai, S.

AU - Bijlsma, K. I.

AU - Poirier, L.

AU - de Wit, E.

AU - Assink, L.

AU - Lassise, A.

AU - Rabadán, I.

AU - Méndez, L.

AU - Sheil, J.

AU - Versolato, O. O.

AU - Hoekstra, R.

N1 - Funding Information: This work is part of the research portfolio of the Advanced Research Center for Nanolithography (ARCNL), a public-private partnership between the University of Amsterdam (UvA), the Vrije Universiteit Amsterdam (VU), the University of Groningen (RuG), the Netherlands Organization for Scientific Research (NWO), and the semiconductor equipment manufacturer ASML. The project is co-financed by Holland High Tech with PPS allowance for research and development in the top sector HTSM. The theoretical work of I R and L M was partially supported by Ministerio de Economía and Competitividad (Spain), Project No. FIS2017-84684-R. The computational support by the Centro de Computación Científica of UAM is also acknowledged. Publisher Copyright: © 2023 The Author(s). Published by IOP Publishing Ltd.

PY - 2023/3

Y1 - 2023/3

N2 - Charge-state-resolved kinetic energy spectra of Sn ions ejected from a laser-produced plasma (LPP) of Sn have been measured at different densities of the H2 buffer gas surrounding a micro-droplet LPP. In the absence of H2, energetic keV Sn ions with charge states ranging from 4+ to 8+ are measured. For the H2 densities used in the experiments no appreciable stopping or energy loss of the ions is observed. However, electron capture by Sn ions from H2 results in a rapid shift toward lower charge states. At the highest H2 pressure of 6 × 10 − 4 mbar, only Sn2+ and Sn+ ions are measured. The occurrence of Sn+ ions is remarkable due to the endothermic nature of electron capture by Sn2+ ions from H2. To explain the production of keV Sn+ ions, it is proposed that their generation is due to electron capture by metastable Sn 2 + ∗ ions. The gateway role of metastable Sn 2 + ∗ is underpinned by model simulations using atomic collision cross sections to track the charge states of Sn ions while traversing the H2 buffer gas.

AB - Charge-state-resolved kinetic energy spectra of Sn ions ejected from a laser-produced plasma (LPP) of Sn have been measured at different densities of the H2 buffer gas surrounding a micro-droplet LPP. In the absence of H2, energetic keV Sn ions with charge states ranging from 4+ to 8+ are measured. For the H2 densities used in the experiments no appreciable stopping or energy loss of the ions is observed. However, electron capture by Sn ions from H2 results in a rapid shift toward lower charge states. At the highest H2 pressure of 6 × 10 − 4 mbar, only Sn2+ and Sn+ ions are measured. The occurrence of Sn+ ions is remarkable due to the endothermic nature of electron capture by Sn2+ ions from H2. To explain the production of keV Sn+ ions, it is proposed that their generation is due to electron capture by metastable Sn 2 + ∗ ions. The gateway role of metastable Sn 2 + ∗ is underpinned by model simulations using atomic collision cross sections to track the charge states of Sn ions while traversing the H2 buffer gas.

KW - charge exchange

KW - EUV source

KW - ion-atom collisions

KW - laser-produced plasma

UR - https://www.scopus.com/pages/publications/85150892421

UR - https://www.scopus.com/inward/citedby.url?scp=85150892421&partnerID=8YFLogxK

U2 - 10.1088/1361-6595/acc274

DO - 10.1088/1361-6595/acc274

M3 - Article

AN - SCOPUS:85150892421

SN - 0963-0252

VL - 32

SP - 1

EP - 8

JO - Plasma Sources Science and Technology

JF - Plasma Sources Science and Technology

IS - 3

M1 - 035006

ER -