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Exfoliation and transfer of millimetre-sized MoS2flakes on arbitrary substrates

  • Riccardo Galafassi*
  • , Ermes Peci
  • , Valentina Venturino
  • , Michele Magnozzi
  • , Francesca Telesio
  • , Maurizio Canepa
  • , Francesco Bisio
  • *Corresponding author for this work

Research output: Contribution to JournalArticleAcademicpeer-review

Abstract

Two-dimensional (2D) materials have the potential to strongly and sustainably influence technological development in the fields of optoelectronics, energy production and management, catalysis and more. One limiting factor that presently prevents the full exploitation of these materials is, however, the difficulty of obtaining large-scale, high-quality 2D samples on arbitrary substrates. In this work, we introduce a significant generalization of previously reported gold-assisted exfoliation techniques for TMDCs, marking a step forward towards the fabrication of macroscopic 2D material samples on arbitrary substrates. We achieved the successful production of millimetre-sized monolayer MoS2 onto silica, PDMS, and both thermal and native oxidized silicon wafers. Moreover, our method simplifies previously reported gold-assisted exfoliation methods by removing substrate functionalization procedures and complex steps to achieve a reliable and reproducible procedure. The crystal quality of the monolayers was probed using XPS, Raman and photoluminescence spectroscopies, revealing a negligible presence of contaminants and defects in the samples. Furthermore, using imaging ellipsometry, we could investigate, on the millimetre scale, the sample morphology and the selectivity of the exfoliation process to produce single layer MoS2 flakes. Finally, we further extended the capability of our exfoliation method by enabling the seamless transfer of large-area samples from PDMS to advanced substrates, unlocking new possibilities for large-scale 2D device fabrication.

Original languageEnglish
Pages (from-to)1228-1239
Number of pages12
JournalNanoscale Advances
Volume8
Issue number4
Early online date1 Dec 2025
DOIs
Publication statusPublished - 17 Feb 2026

Bibliographical note

Publisher Copyright:
This journal is © The Royal Society of Chemistry, 2026

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