Abstract
We demonstrate highly efficient 2 µm-wavelength laser-produced plasma light sources for nanolithographic applications, reaching efficiencies of up to 5%.
| Original language | English |
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| DOIs | |
| Publication status | Published - 2024 |
| Event | Compact EUV and X-Ray Light Sources, EUVXRAY 2024 - Part of Optica High-Brightness Sources and Light-Driven Interactions Congress - Vienna, Austria Duration: 12 Mar 2024 → 14 Mar 2024 |
Conference
| Conference | Compact EUV and X-Ray Light Sources, EUVXRAY 2024 - Part of Optica High-Brightness Sources and Light-Driven Interactions Congress |
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| Country/Territory | Austria |
| City | Vienna |
| Period | 12/03/24 → 14/03/24 |
Bibliographical note
Publisher Copyright:© Optica 2024
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