How does hydrofluoric acid etching affect the cyclic load-to-failure of lithium disilicate restorations?

C. Prochnow, G.K. Rocha Pereira, A.B. Venturini, M.M. Scherer, M.P. Rippe, M.C. Bottino, C.J. Kleverlaan, L.F. Valandro

Research output: Contribution to JournalArticleAcademicpeer-review

Abstract

This study investigated the effect of etching with distinct hydrofluoric (HF) acid concentrations on the cyclic load-to-failure (CLf) of simplified lithium disilicate glass-ceramic restorations adhesively cemented to a dentin analogue (n = 20): non-etched/control (CTRL), or etched for 20 s with HF acid at 3% (HF3), 5% (HF5), or 10% (HF10). A silane coating was then applied onto the ceramic surfaces. Fatigue tests followed the staircase approach (initial load= 720 N; step-size= 70 N; 500,000 cycles per sample; 20 Hz) using a hemispheric stainless-steel piston (Ø= 40 mm) under water. The CLf data were analyzed using Dixon and Mood method. Topographic and fractographic analyses were conducted. CLf (in N) of HF3 (1355 ± 32.0) and HF5 (1335 ± 58.8) groups were the highest and statistically similar; HF10 presented intermediate CLf (1175 ± 132.9), while the non-etched group had the lowest one (965 ± 145.0). Topographical analysis showed that the higher the HF acid concentration, the more pronounced the topographical changes. All failures (radial cracks) started from the inner surface of the ceramic discs. Topographical changes promoted by intermediate HF acid concentrations (3% and 5%) may improve fatigue performance for adhesively-cemented lithium disilicate restorations.
Original languageEnglish
Pages (from-to)306-311
JournalJournal of the Mechanical Behavior of Biomedical Materials
Volume87
DOIs
Publication statusPublished - 2018

Funding

The authors thank Ivoclar Vivadent and FGM Produtos Odontológicos for donating their materials. We thank the Agency for the High-Standard Promotion of Graduate Courses, Brazil (CAPES) PhD scholarship (C. Prochnow, AB Venturini) and grants for CAPES/NUFFIC Program (Netherlands Organisation for International Cooperation in Higher Education), and the Brazilian National Council for Scientific and Technological Development (CNPq) for providing Scientific Initiation scholarship (M. Scherer).

FundersFunder number
Netherlands Organization for International Cooperation in Higher Education
Coordenação de Aperfeiçoamento de Pessoal de Nível Superior
Conselho Nacional de Desenvolvimento Científico e Tecnológico

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