TY - GEN
T1 - Improving Model Inference in Industry by Combining Active and Passive Learning
AU - Yang, N.
AU - Aslam, K.
AU - Schiffelers, R.
AU - Lensink, L.
AU - Hendriks, D.
AU - Cleophas, L.
AU - Serebrenik, A.
PY - 2019/3/15
Y1 - 2019/3/15
N2 - © 2019 IEEE.Inferring behavioral models (e.g., state machines) of software systems is an important element of re-engineering activities. Model inference techniques can be categorized as active or passive learning, constructing models by (dynamically) interacting with systems or (statically) analyzing traces, respectively. Application of those techniques in the industry is, however, hindered by the trade-off between learning time and completeness achieved (active learning) or by incomplete input logs (passive learning). We investigate the learning time/completeness achieved trade-off of active learning with a pilot study at ASML, provider of lithography systems for the semiconductor industry. To resolve the trade-off we advocate extending active learning with execution logs and passive learning results.We apply the extended approach to eighteen components used in ASML TWINSCAN lithography machines. Compared to traditional active learning, our approach significantly reduces the active learning time. Moreover, it is capable of learning the behavior missed by the traditional active learning approach.
AB - © 2019 IEEE.Inferring behavioral models (e.g., state machines) of software systems is an important element of re-engineering activities. Model inference techniques can be categorized as active or passive learning, constructing models by (dynamically) interacting with systems or (statically) analyzing traces, respectively. Application of those techniques in the industry is, however, hindered by the trade-off between learning time and completeness achieved (active learning) or by incomplete input logs (passive learning). We investigate the learning time/completeness achieved trade-off of active learning with a pilot study at ASML, provider of lithography systems for the semiconductor industry. To resolve the trade-off we advocate extending active learning with execution logs and passive learning results.We apply the extended approach to eighteen components used in ASML TWINSCAN lithography machines. Compared to traditional active learning, our approach significantly reduces the active learning time. Moreover, it is capable of learning the behavior missed by the traditional active learning approach.
UR - https://www.scopus.com/pages/publications/85064164636
UR - https://www.scopus.com/pages/publications/85064164636#tab=citedBy
U2 - 10.1109/SANER.2019.8668007
DO - 10.1109/SANER.2019.8668007
M3 - Conference contribution
SN - 9781728105918
T3 - SANER 2019 - Proceedings of the 2019 IEEE 26th International Conference on Software Analysis, Evolution, and Reengineering
SP - 253
EP - 263
BT - SANER 2019 - Proceedings of the 2019 IEEE 26th International Conference on Software Analysis, Evolution, and Reengineering
A2 - Shihab, E.
A2 - Lo, D.
A2 - Wang, X.
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 26th IEEE International Conference on Software Analysis, Evolution, and Reengineering, SANER 2019
Y2 - 24 February 2019 through 27 February 2019
ER -