Improving the precision of semiconductor overlay measurements using dark-field digital holographic microscopy

M. Adhikary, T. Cromwijk, C. Messinis, J. de Wit, S. Konijnenberg, S. Witte, J. de Boer, A. J. den Boef

Research output: Chapter in Book / Report / Conference proceedingConference contributionAcademicpeer-review

Abstract

We present dark-field d igital h olographic m icroscopy f or diffraction-based overlay metrology in semiconductor layers with feature size of a few nanometers. We aim for higher accuracy and precision by calibrating the illumination profile on the targets.

Original languageEnglish
Title of host publication3D Image Acquisition and Display: Technology, Perception and Applications
Subtitle of host publicationProceedings Imaging and Applied Optics Congress 2022 (3D, AOA, COSI, ISA, pcAOP)
PublisherOptica Publishing Group (formerly OSA)
ISBN (Electronic)9781557528209
DOIs
Publication statusPublished - 2022
EventComputational Optical Sensing and Imaging, COSI 2022 - Vancouver, Canada
Duration: 11 Jul 202215 Jul 2022

Publication series

NameOptics InfoBase Conference Papers

Conference

ConferenceComputational Optical Sensing and Imaging, COSI 2022
Country/TerritoryCanada
CityVancouver
Period11/07/2215/07/22

Bibliographical note

Publisher Copyright:
© 2022 The Author(s)

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