Material-specific high-order harmonic generation in laser-produced plasmas for varying plasma dynamics

Jan Mathijssen, Zeudi Mazzotta, Amelie M. Heinzerling, Kjeld S.E. Eikema, Stefan Witte*

*Corresponding author for this work

Research output: Contribution to JournalArticleAcademicpeer-review

Abstract

We present a new experimental setup for high-order harmonic generation in laser-produced plasmas, allowing the generation of coherent VUV and EUV light, as well as characterisation of the laser-produced plasmas by studying the emitted harmonics. We have successfully generated high-order harmonics in laser-produced Al, Ni, Ag, In, and Sn plasmas. Large differences in harmonic spectra and signal yields have been observed for these different targets. Harmonics up to order 25, corresponding to a wavelength of 62.4 nm and photon energy of 19.9 eV, have been measured with tin plasmas. Scanning laser parameters and delay between pump and fundamental laser pulses allows us to optimise the harmonic yield and observe the temporal dynamics of the laser-produced tin plasma.

Original languageEnglish
Article number91
Pages (from-to)1-11
Number of pages11
JournalApplied Physics B: Lasers and Optics
Volume129
Issue number6
Early online date13 May 2023
DOIs
Publication statusPublished - Jun 2023

Bibliographical note

Funding Information:
The authors thank Nik Noest for technical support, Lucas Poirier for his contribution to the RFA data analysis, and Dr. Aneta Stodolna and Tiago de Faria Pinto for their contribution to the development of the setup. This work has been carried out at the Advanced Research Center for Nanolithography (ARCNL), a public-private partnership of the University of Amsterdam, the Vrije Universiteit Amsterdam, the Netherlands Organization for Scientific Research (NWO) and the semiconductor equipment manufacturer ASML.

Publisher Copyright:
© 2023, The Author(s).

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