Abstract
Plasma produced from molten-tin microdroplets generates extreme ultraviolet light for state-of-the-art nanolithography. Currently, CO2 lasers are used to drive the plasma. In the future, solid-state mid-infrared lasers may instead be used to efficiently pump the plasma. Such laser systems have promise to be more compact, better scalable, and have higher wall-plug efficiency. In this Topical Review, we present recent findings made at the Advanced Research Center for Nanolithography (ARCNL) on using 1 and 2 μm wavelength solid-state lasers for tin target preparation and for driving hot and dense plasma. The ARCNL research ranges from advanced laser development, studies of fluid dynamic response of droplets to impact, radiation-hydrodynamics calculations of, e.g. ion 'debris', (EUV) spectroscopic studies of tin laser-produced-plasma as well as high-conversion efficiency operation of 2 μm wavelength driven plasma.
| Original language | English |
|---|---|
| Article number | 054014 |
| Pages (from-to) | 1-12 |
| Number of pages | 12 |
| Journal | Journal of Optics (United Kingdom) |
| Volume | 24 |
| Issue number | 5 |
| Early online date | 22 Apr 2022 |
| DOIs | |
| Publication status | Published - May 2022 |
Bibliographical note
Funding Information:This work has been carried out at the Advanced Research Center for Nanolithography (ARCNL), a public-private partnership of the University of Amsterdam (UvA), the Vrije Universiteit Amsterdam, the Netherlands Organisation for Scientific Research (NWO) and the semiconductor equipment manufacturer ASML. The author gratefully acknowledges the team at ARCNL, comprising Dmitry Kurilovich, Francesco Torretti, Joris Scheers, Ruben Schupp, Lars Behnke, Yahia Mostafa, Bo Liu, Karl Schubert, Javier Hernandez-Rueda, Dion Engels, Maria Morbey, Jaap Hermens, Job Duffhues, Zoi Bouza, Alex Bayerle, Adam Lassise, Zeudi Mazzotta, Lucas Poirier, Diko Hemminga, Mart Johan Deuzeman, Subam Rai, Klaas Bijlsma, Laurens van Buuren, Randy Meijer, Tiago de Faria Pinto, and Kjeld Eikema. Further, input from Igor Fomenkov, Michael Purvis, Wim van der Zande, Fei Liu, Hanneke Gelderblom, Sten Reijers, Alexander Klein, James Byers Muharrem Bayraktar, Fred Bijkerk, Marcelo Ackermann, Aneta Stodolna, Alexander Windberger, Hendrik Bekker, José Crespo Lopez-Urrutia, Julian Berengut, Anastasia Borschevsky, Vivek Bakshi, Howard Scott, Amanda Neukirch, James Colgan, Alexandr Ryabtsev and Mikhail Basko (and many others) was much appreciated. This project has received funding from European Research Council (ERC) Starting Grant Numbered 802648 and is part of the VIDI research programme with Project Number 15697, which is financed by the Netherlands Organisation for Scientific Research (NWO).
Publisher Copyright:
© 2022 The Author(s). Published by IOP Publishing Ltd.
Funding
This work has been carried out at the Advanced Research Center for Nanolithography (ARCNL), a public-private partnership of the University of Amsterdam (UvA), the Vrije Universiteit Amsterdam, the Netherlands Organisation for Scientific Research (NWO) and the semiconductor equipment manufacturer ASML. The author gratefully acknowledges the team at ARCNL, comprising Dmitry Kurilovich, Francesco Torretti, Joris Scheers, Ruben Schupp, Lars Behnke, Yahia Mostafa, Bo Liu, Karl Schubert, Javier Hernandez-Rueda, Dion Engels, Maria Morbey, Jaap Hermens, Job Duffhues, Zoi Bouza, Alex Bayerle, Adam Lassise, Zeudi Mazzotta, Lucas Poirier, Diko Hemminga, Mart Johan Deuzeman, Subam Rai, Klaas Bijlsma, Laurens van Buuren, Randy Meijer, Tiago de Faria Pinto, and Kjeld Eikema. Further, input from Igor Fomenkov, Michael Purvis, Wim van der Zande, Fei Liu, Hanneke Gelderblom, Sten Reijers, Alexander Klein, James Byers Muharrem Bayraktar, Fred Bijkerk, Marcelo Ackermann, Aneta Stodolna, Alexander Windberger, Hendrik Bekker, José Crespo Lopez-Urrutia, Julian Berengut, Anastasia Borschevsky, Vivek Bakshi, Howard Scott, Amanda Neukirch, James Colgan, Alexandr Ryabtsev and Mikhail Basko (and many others) was much appreciated. This project has received funding from European Research Council (ERC) Starting Grant Numbered 802648 and is part of the VIDI research programme with Project Number 15697, which is financed by the Netherlands Organisation for Scientific Research (NWO).
| Funders | Funder number |
|---|---|
| Universiteit van Amsterdam | |
| Nederlandse Organisatie voor Wetenschappelijk Onderzoek | |
| Horizon 2020 Framework Programme | 802648 |
| European Research Council | 15697 |
Keywords
- EUV
- laser-produced plasma
- nanolithography
- solid-state lasers
- spectroscopy
- tin microdroplets