Modeling the hundreds-of-nanoseconds-long irradiation of tin droplets with a 2 µm-wavelength laser for future EUV lithography
- S. J.J. de Lange
- , D. J. Hemminga
- , Y. Mostafa
- , R. A. Meijer
- , O. O. Versolato
- , J. Sheil*
*Corresponding author for this work
Research output: Contribution to Journal › Article › Academic › peer-review