Modeling the hundreds-of-nanoseconds-long irradiation of tin droplets with a 2 µm-wavelength laser for future EUV lithography

S. J.J. de Lange, D. J. Hemminga, Y. Mostafa, R. A. Meijer, O. O. Versolato, J. Sheil*

*Corresponding author for this work

Research output: Contribution to Journal › Article › Academic › peer-review

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