Nanolithography with metastable helium atoms in a high-power standing-wave light field

S.J.H. Petra; L. Feenstra; W. Hogervorst; W. Vassen

doi:10.1007/s00340-003-1371-8

Nanolithography with metastable helium atoms in a high-power standing-wave light field

S.J.H. Petra, L. Feenstra, W. Hogervorst, W. Vassen

Quantum Metrology & Laser Applications

Research output: Contribution to Journal › Article › Academic › peer-review

Abstract

We have created periodic nanoscale structures in a gold substrate with a lithography process using metastable triplet helium atoms that damage a hydrophobic resist layer on top of the substrate. A beam of metastable helium atoms is transversely collimated and guided through an intense standing-wave light field. Compared to commonly used low-power optical masks, a high-power light field (saturation parameter of 10

Original language	English
Pages (from-to)	133-136
Journal	Applied Physics B. Lasers and Optics
Volume	78
Issue number	2
DOIs	https://doi.org/10.1007/s00340-003-1371-8
Publication status	Published - 2004

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10.1007/s00340-003-1371-8

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title = "Nanolithography with metastable helium atoms in a high-power standing-wave light field",

abstract = "We have created periodic nanoscale structures in a gold substrate with a lithography process using metastable triplet helium atoms that damage a hydrophobic resist layer on top of the substrate. A beam of metastable helium atoms is transversely collimated and guided through an intense standing-wave light field. Compared to commonly used low-power optical masks, a high-power light field (saturation parameter of 10",

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AU - Hogervorst, W.

AU - Vassen, W.

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AB - We have created periodic nanoscale structures in a gold substrate with a lithography process using metastable triplet helium atoms that damage a hydrophobic resist layer on top of the substrate. A beam of metastable helium atoms is transversely collimated and guided through an intense standing-wave light field. Compared to commonly used low-power optical masks, a high-power light field (saturation parameter of 10

U2 - 10.1007/s00340-003-1371-8

DO - 10.1007/s00340-003-1371-8

M3 - Article

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JO - Applied Physics B. Lasers and Optics

JF - Applied Physics B. Lasers and Optics

IS - 2

ER -

Nanolithography with metastable helium atoms in a high-power standing-wave light field

Abstract

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