Nanometer Interlaced Displacement Metrology Using Diffractive Pancharatnam-Berry and Detour Phase Metasurfaces

Nick Feldman, Kian M.M. Goeloe, Arie J. den Boef, Lyubov V. Amitonova, A. Femius Koenderink*

*Corresponding author for this work

Research output: Contribution to JournalArticleAcademicpeer-review

Abstract

Resolving structural misalignments on the nanoscale is of utmost importance in areas such as semiconductor device manufacturing. Metaphotonics provides a powerful toolbox to efficiently transduce information on the nanoscale into measurable far-field observables. In this work, we propose and demonstrate a novel interlaced displacement sensing platform based on diffractive anisotropic metasurfaces combined with polarimetric Fourier microscopy capable of resolving a few nanometer displacements within a device layer. We show that the sensing mechanism relies on an interplay of Pancharatnam-Berry and detour phase shifts and argue how nanoscale displacements are transduced into specific polarization signatures in the diffraction orders. We discuss efficient measurement protocols suitable for high-speed metrology applications and lay out optimization strategies for maximal sensing responsivity. Finally, we show that the proposed platform is capable of resolving arbitrary two-dimensional displacements on a device.

Original languageEnglish
Pages (from-to)5229-5238
Number of pages10
JournalACS Photonics
Volume11
Issue number12
Early online date30 Nov 2024
DOIs
Publication statusPublished - 18 Dec 2024

Bibliographical note

Publisher Copyright:
© 2024 The Authors. Published by American Chemical Society.

Keywords

  • detour phase
  • Fourier microscopy
  • metasurfaces
  • metrology
  • Pancharatnam-Berry phase
  • polarimetry

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