Abstract
Resolving structural misalignments on the nanoscale is of utmost importance in areas such as semiconductor device manufacturing. Metaphotonics provides a powerful toolbox to efficiently transduce information on the nanoscale into measurable far-field observables. In this work, we propose and demonstrate a novel interlaced displacement sensing platform based on diffractive anisotropic metasurfaces combined with polarimetric Fourier microscopy capable of resolving a few nanometer displacements within a device layer. We show that the sensing mechanism relies on an interplay of Pancharatnam-Berry and detour phase shifts and argue how nanoscale displacements are transduced into specific polarization signatures in the diffraction orders. We discuss efficient measurement protocols suitable for high-speed metrology applications and lay out optimization strategies for maximal sensing responsivity. Finally, we show that the proposed platform is capable of resolving arbitrary two-dimensional displacements on a device.
Original language | English |
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Pages (from-to) | 5229-5238 |
Number of pages | 10 |
Journal | ACS Photonics |
Volume | 11 |
Issue number | 12 |
Early online date | 30 Nov 2024 |
DOIs | |
Publication status | Published - 18 Dec 2024 |
Bibliographical note
Publisher Copyright:© 2024 The Authors. Published by American Chemical Society.
Keywords
- detour phase
- Fourier microscopy
- metasurfaces
- metrology
- Pancharatnam-Berry phase
- polarimetry