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Near-Unity All-Optical Modulation of Third-Harmonic Generation with a Fano-Resonant Dielectric Metasurface

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Abstract

We demonstrate all-optical modulation with a near-unity contrast of nonlinear light generation in a dielectric metasurface. We study third-harmonic generation from silicon Fano-resonant metasurfaces excited by femtosecond pulses at 1480 nm wavelength. We modulate the metasurface resonance by free carrier excitation induced by absorption of an 800 nm pump pulse, leading to up to 93% suppression of third-harmonic generation. Modulation and recovery occur on (sub)picosecond time scales. According to the Drude model, the pump-induced refractive index change blue-shifts the metasurface resonance away from the generation pulse, causing a strong modulation of third-harmonic conversion efficiency. The principle holds great promise for spatiotemporal programmability of nonlinear light generation.
Original languageEnglish
Pages (from-to)12942–12947
Number of pages6
JournalNano Letters
Volume24
Issue number41
Early online date2 Oct 2024
DOIs
Publication statusPublished - 16 Oct 2024

Funding

This work is part of the Dutch Research Council (NWO) and was performed at the research institutes ARCNL and AMOLF. The Advanced Research Center for Nanolithography (ARCNL) is a public\u2013private partnership between the University of Amsterdam, Vrije Universiteit Amsterdam, Rijksuniversiteit Groningen (RUG), The Netherlands Organization for Scientifc Research (NWO), and the semiconductor-equipment manufacturer ASML. This manuscript is part of a project that has received funding from the European Research Council (ERC) under the European Union\u2019s Horizon Europe research and innovation program (Grant Agreement No. 101041819, ERC Starting Grant ANACONDA).

FundersFunder number
European Research Council
European Union’s Horizon Europe research and innovation program101041819

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