TY - JOUR
T1 - Noninvasive Deterministic Nanostructures Lithography on 2D Transition Metal Dichalcogenides
AU - Ramò, Lorenzo
AU - Peci, Ermes
AU - Magnozzi, Michele
AU - Spotorno, Emma
AU - Venturino, Valentina
AU - Sygletou, Maria
AU - Giordano, Maria Caterina
AU - Zambito, Giorgio
AU - Telesio, Francesca
AU - Milosz, Zygmunt
AU - Canepa, Maurizio
AU - Bisio, Francesco
PY - 2025/1/1
Y1 - 2025/1/1
N2 - The coupling of nanostructures with emerging 2D semiconductors is gaining significant interest thanks to the unique features of these hybrids systems, which make them key platforms for next-generation applications in electronics, optoelectronics, and sensing. Top-down lithographic approaches uniquely enable the fully deterministic high-resolution fabrication of nanostructures, but some of them, like electron-beam lithography and focused ion-beam lithography, employ energetic particles that may damage 2D materials causing an unwanted loss of functionality. Herein thermal scanning probe lithography is applied for the realization of metallic nanoantennas directly on top of exfoliated 2D MoS2 flakes, showing it can avoid the degradation of this delicate substrate. It is shown that the morphologic and optical features of MoS2 are fully preserved after the lithography.
AB - The coupling of nanostructures with emerging 2D semiconductors is gaining significant interest thanks to the unique features of these hybrids systems, which make them key platforms for next-generation applications in electronics, optoelectronics, and sensing. Top-down lithographic approaches uniquely enable the fully deterministic high-resolution fabrication of nanostructures, but some of them, like electron-beam lithography and focused ion-beam lithography, employ energetic particles that may damage 2D materials causing an unwanted loss of functionality. Herein thermal scanning probe lithography is applied for the realization of metallic nanoantennas directly on top of exfoliated 2D MoS2 flakes, showing it can avoid the degradation of this delicate substrate. It is shown that the morphologic and optical features of MoS2 are fully preserved after the lithography.
UR - http://www.scopus.com/inward/record.url?scp=85210751380&partnerID=8YFLogxK
U2 - 10.1002/adem.202401157
DO - 10.1002/adem.202401157
M3 - Article
SN - 1438-1656
VL - 27
JO - Advanced Engineering Materials
JF - Advanced Engineering Materials
IS - 1
M1 - 2401157
ER -