Phase-resolved semiconductor overlay metrology with a dark field holographic microscope

V. T. Tenner*, C. Messinis, A. J. den Boef

*Corresponding author for this work

Research output: Chapter in Book / Report / Conference proceedingConference contributionAcademicpeer-review

Abstract

Current optical sensors used for overlay metrology during semiconductor manufacturing are limited on the available stack-thickness wavelength combinations. We present a dark field holographic sensor concept that lifts this limitation and show an experimental demonstration.

Original languageEnglish
Title of host publicationDigital Holography and Three-Dimensional Imaging 2019
Subtitle of host publicationProceedings
PublisherOptical Society of America (OSA)
ISBN (Electronic)9781943580590
DOIs
Publication statusPublished - 13 May 2019
Event2019 Conference on Digital Holography and Three-Dimensional Imaging, DH 2019 - Bordeaux, France
Duration: 19 May 201923 May 2019

Publication series

NameOptics InfoBase Conference Papers

Conference

Conference2019 Conference on Digital Holography and Three-Dimensional Imaging, DH 2019
CountryFrance
CityBordeaux
Period19/05/1923/05/19

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