Physics of laser-produced plasma sources of extreme ultraviolet radiation

O. O. Versolato; D. Kurilovich; F. Torretti; R. Schupp; J. Scheers; M. J. Deuzeman; A. Bayerle; R. Hoekstra; W. Ubachs

doi:10.1364/EUVXRAY.2018.ET3B.4

Physics of laser-produced plasma sources of extreme ultraviolet radiation

O. O. Versolato^*, D. Kurilovich, F. Torretti, R. Schupp, J. Scheers, M. J. Deuzeman, A. Bayerle, R. Hoekstra, W. Ubachs

^*Corresponding author for this work

Research output: Chapter in Book / Report / Conference proceeding › Conference contribution › Academic › peer-review

Abstract

Laser-produced tin plasmas are used for the generation of extreme ultraviolet light for nanolithography. We use an extensive diagnostic toolset to characterize and understand the physics of these plasma light sources at the atomic level.

Original language	English
Title of host publication	Compact EUV and X-ray Light Sources (EUVXRAY 2018)
Subtitle of host publication	[Proceedings]
Publisher	OSA - The Optical Society
Number of pages	2
ISBN (Electronic)	9781557528209
ISBN (Print)	9781943580408
DOIs	https://doi.org/10.1364/EUVXRAY.2018.ET3B.4
Publication status	Published - 2018
Event	Compact EUV and X-ray Light Sources, EUVXRAY 2018 - Strasbourg, France Duration: 26 Mar 2017 → 28 Mar 2017

Conference

Conference	Compact EUV and X-ray Light Sources, EUVXRAY 2018
Country/Territory	France
City	Strasbourg
Period	26/03/17 → 28/03/17

Bibliographical note

Part F85-EUVXRAY 2018

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10.1364/EUVXRAY.2018.ET3B.4

https://www.researchgate.net/publication/324076327_Physics_of_Laser-Produced_Plasma_Sources_of_Extreme_Ultraviolet_Radiation

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@inproceedings{46c5cc0f962640bbb9ba17d4845373c3,

title = "Physics of laser-produced plasma sources of extreme ultraviolet radiation",

abstract = "Laser-produced tin plasmas are used for the generation of extreme ultraviolet light for nanolithography. We use an extensive diagnostic toolset to characterize and understand the physics of these plasma light sources at the atomic level.",

author = "Versolato, {O. O.} and D. Kurilovich and F. Torretti and R. Schupp and J. Scheers and Deuzeman, {M. J.} and A. Bayerle and R. Hoekstra and W. Ubachs",

note = "Part F85-EUVXRAY 2018; Compact EUV and X-ray Light Sources, EUVXRAY 2018 ; Conference date: 26-03-2017 Through 28-03-2017",

year = "2018",

doi = "10.1364/EUVXRAY.2018.ET3B.4",

language = "English",

isbn = "9781943580408",

booktitle = "Compact EUV and X-ray Light Sources (EUVXRAY 2018)",

publisher = "OSA - The Optical Society",

}

Versolato, OO, Kurilovich, D, Torretti, F, Schupp, R, Scheers, J, Deuzeman, MJ, Bayerle, A, Hoekstra, R & Ubachs, W 2018, Physics of laser-produced plasma sources of extreme ultraviolet radiation. in Compact EUV and X-ray Light Sources (EUVXRAY 2018): [Proceedings]. OSA - The Optical Society, Compact EUV and X-ray Light Sources, EUVXRAY 2018, Strasbourg, France, 26/03/17. https://doi.org/10.1364/EUVXRAY.2018.ET3B.4

TY - GEN

T1 - Physics of laser-produced plasma sources of extreme ultraviolet radiation

AU - Versolato, O. O.

AU - Kurilovich, D.

AU - Torretti, F.

AU - Schupp, R.

AU - Scheers, J.

AU - Deuzeman, M. J.

AU - Bayerle, A.

AU - Hoekstra, R.

AU - Ubachs, W.

N1 - Part F85-EUVXRAY 2018

PY - 2018

Y1 - 2018

N2 - Laser-produced tin plasmas are used for the generation of extreme ultraviolet light for nanolithography. We use an extensive diagnostic toolset to characterize and understand the physics of these plasma light sources at the atomic level.

AB - Laser-produced tin plasmas are used for the generation of extreme ultraviolet light for nanolithography. We use an extensive diagnostic toolset to characterize and understand the physics of these plasma light sources at the atomic level.

UR - http://www.scopus.com/inward/record.url?scp=85047111493&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85047111493&partnerID=8YFLogxK

U2 - 10.1364/EUVXRAY.2018.ET3B.4

DO - 10.1364/EUVXRAY.2018.ET3B.4

M3 - Conference contribution

AN - SCOPUS:85047111493

SN - 9781943580408

BT - Compact EUV and X-ray Light Sources (EUVXRAY 2018)

PB - OSA - The Optical Society

T2 - Compact EUV and X-ray Light Sources, EUVXRAY 2018

Y2 - 26 March 2017 through 28 March 2017

ER -

Physics of laser-produced plasma sources of extreme ultraviolet radiation

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