Abstract
Laser-produced tin plasmas are used for the generation of extreme ultraviolet light for nanolithography. We use an extensive diagnostic toolset to characterize and understand the physics of these plasma light sources at the atomic level.
Original language | English |
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Title of host publication | Compact EUV and X-ray Light Sources (EUVXRAY 2018) |
Subtitle of host publication | [Proceedings] |
Publisher | OSA - The Optical Society |
Number of pages | 2 |
ISBN (Electronic) | 9781557528209 |
ISBN (Print) | 9781943580408 |
DOIs | |
Publication status | Published - 2018 |
Event | Compact EUV and X-ray Light Sources, EUVXRAY 2018 - Strasbourg, France Duration: 26 Mar 2017 → 28 Mar 2017 |
Conference
Conference | Compact EUV and X-ray Light Sources, EUVXRAY 2018 |
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Country/Territory | France |
City | Strasbourg |
Period | 26/03/17 → 28/03/17 |