Physics of laser-produced plasma sources of extreme ultraviolet radiation

O. O. Versolato*, D. Kurilovich, F. Torretti, R. Schupp, J. Scheers, M. J. Deuzeman, A. Bayerle, R. Hoekstra, W. Ubachs

*Corresponding author for this work

Research output: Chapter in Book / Report / Conference proceedingConference contributionAcademicpeer-review

Abstract

Laser-produced tin plasmas are used for the generation of extreme ultraviolet light for nanolithography. We use an extensive diagnostic toolset to characterize and understand the physics of these plasma light sources at the atomic level.

Original languageEnglish
Title of host publicationCompact EUV and X-ray Light Sources, EUVXRAY 2018
PublisherOSA - The Optical Society
VolumePart F85-EUVXRAY 2018
ISBN (Electronic)9781557528209
DOIs
Publication statusPublished - 1 Jan 2018
EventCompact EUV and X-ray Light Sources, EUVXRAY 2018 - Strasbourg, France
Duration: 26 Mar 201728 Mar 2017

Conference

ConferenceCompact EUV and X-ray Light Sources, EUVXRAY 2018
CountryFrance
CityStrasbourg
Period26/03/1728/03/17

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  • Cite this

    Versolato, O. O., Kurilovich, D., Torretti, F., Schupp, R., Scheers, J., Deuzeman, M. J., ... Ubachs, W. (2018). Physics of laser-produced plasma sources of extreme ultraviolet radiation. In Compact EUV and X-ray Light Sources, EUVXRAY 2018 (Vol. Part F85-EUVXRAY 2018). OSA - The Optical Society. https://doi.org/10.1364/EUVXRAY.2018.ET3B.4