Plasma sources for advanced semiconductor applications

Oscar Versolato*, Igor Kaganovich, Kallol Bera, Thorsten Lill, Hyo Chang Lee, Ronnie Hoekstra, John Sheil, Sang Ki Nam

*Corresponding author for this work

Research output: Contribution to JournalEditorialAcademicpeer-review

Original languageEnglish
Article number230401
Pages (from-to)1-8
Number of pages9
JournalApplied Physics Letters
Volume125
Issue number23
DOIs
Publication statusPublished - 2 Dec 2024

Bibliographical note

Online published: December 05 2024

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