Original language | English |
---|---|
Article number | 230401 |
Pages (from-to) | 1-8 |
Number of pages | 9 |
Journal | Applied Physics Letters |
Volume | 125 |
Issue number | 23 |
DOIs | |
Publication status | Published - 2 Dec 2024 |
Plasma sources for advanced semiconductor applications
Oscar Versolato*, Igor Kaganovich, Kallol Bera, Thorsten Lill, Hyo Chang Lee, Ronnie Hoekstra, John Sheil, Sang Ki Nam
*Corresponding author for this work
Research output: Contribution to Journal › Editorial › Academic › peer-review