| Original language | English |
|---|---|
| Article number | 230401 |
| Pages (from-to) | 1-8 |
| Number of pages | 9 |
| Journal | Applied Physics Letters |
| Volume | 125 |
| Issue number | 23 |
| DOIs | |
| Publication status | Published - 2 Dec 2024 |
Plasma sources for advanced semiconductor applications
Oscar Versolato*, Igor Kaganovich, Kallol Bera, Thorsten Lill, Hyo Chang Lee, Ronnie Hoekstra, John Sheil, Sang Ki Nam
*Corresponding author for this work
Research output: Contribution to Journal › Editorial › Academic › peer-review