Power-Law Scaling Relating the Average Charge State and Kinetic Energy in Expanding Laser-Driven Plasmas

J. Sheil, L. Poirier, A. C. Lassise, D. J. Hemminga, S. Schouwenaars, N. Braaksma, A. Frenzel, R. Hoekstra, O. O. Versolato

Research output: Contribution to JournalArticleAcademicpeer-review

Abstract

A universal power-law scaling z¯â E0.4 in the correlation between the average ion charge state z¯ and kinetic energy E in expanding laser-driven tin plasmas is identified. Universality here refers to an insensitivity to all experimental conditions: Target geometry, expansion direction, laser wavelength, and power density. The power law is accurately captured in an analytical consideration of the dependence of the charge state on temperature and the subsequent transfer of internal to kinetic energy in the expansion. These analytical steps are individually, and collectively, validated by a two-dimensional radiation-hydrodynamic simulation of an expanding laser-driven plasma. This power-law behavior is expected to hold also for dense plasma containing heavier, complex ions such as those relevant to current and future laser-driven plasma light sources.

Original languageEnglish
Article number125101
Pages (from-to)1-6
Number of pages6
JournalPhysical review letters
Volume133
Issue number12
Early online date17 Sept 2024
DOIs
Publication statusPublished - 2024

Bibliographical note

Publisher Copyright:
© 2024 authors. Published by the American Physical Society. Published by the American Physical Society under the terms of the "https://creativecommons.org/licenses/by/4.0/" Creative Commons Attribution 4.0 International license. Further distribution of this work must maintain attribution to the author(s) and the published article's title, journal citation, and DOI.

Funding

Part of this work was conducted at the Advanced Research Center for Nanolithography (ARCNL), a public-private partnership between the University of Amsterdam (UvA), Vrije Universiteit Amsterdam (VU), the University of Groningen (UG), the Netherlands Organization for Scientific Research (NWO), and the semiconductor equipment manufacturer ASML. This project has received funding from the European Research Council (ERC) under the European Union\u2019s Horizon 2020 research and innovation program under Grant Agreement No. 802648. This work made use of the Dutch national -infrastructure with the support of the SURF Cooperative using Grant No. EINF-2947.

FundersFunder number
European Research Council
Horizon 2020 Framework Programme802648
SURFEINF-2947

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