Production of 13.5 nm light with 5% conversion efficiency from 2 μ m laser-driven tin microdroplet plasma

Y. Mostafa; L. Behnke; D. J. Engels; Z. Bouza; J. Sheil; W. Ubachs; O. O. Versolato

doi:10.1063/5.0174149

Production of 13.5 nm light with 5% conversion efficiency from 2 μ m laser-driven tin microdroplet plasma

Y. Mostafa, L. Behnke, D. J. Engels, Z. Bouza, J. Sheil, W. Ubachs, O. O. Versolato

Research output: Contribution to Journal › Article › Academic › peer-review

Abstract

We demonstrate the efficient generation of extreme ultraviolet (EUV) light from laser-produced plasma (LPP) driven by 2 μm wavelength laser light as an alternative for 10 μm CO2 gas LPP currently employed in EUV lithography machines for high-volume manufacturing of semiconductor devices. High conversion efficiencies of laser light into “in-band” EUV photons up to 5.0% are achieved by homogeneously heating the plasma that is laser-generated from preshaped tin microdroplet targets. Scaling the laser pulse duration, spot size, and intensity yields a high in-band EUV energy output of up to 12.5 mJ. The EUV emission source size is studied under a similar parameter range and is shown to match typical etendues of EUV optic columns. Our findings make 2 μm LPP a particularly promising candidate to power future EUV nanolithography.

Original language	English
Article number	234101
Journal	Applied Physics Letters
Volume	123
Issue number	23
DOIs	https://doi.org/10.1063/5.0174149
Publication status	Published - 4 Dec 2023

Bibliographical note

Special Collection: Plasma Sources for Advanced Semiconductor Applications

Funding

We would like to thank Iliya Cerjak and Henk-Jan Boluijt for their work in designing the experimental setup and Laurens van Buuren for the aid in assembling the setup and its operation. We would like to further thank Ruben Schupp and Muharrem Bayraktar for their help with the experimental work as well as Lucas Poirier and Michael Purvis for helpful discussions. This research was funded by the European Research Council (ERC StG 802648) and the Dutch Research Council (Vidi 15697 and OTP 19458).

Funders	Funder number
European Research Council	802648
Nederlandse Organisatie voor Wetenschappelijk Onderzoek	OTP 19458, 15697

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title = "Production of 13.5 nm light with 5% conversion efficiency from 2 μ m laser-driven tin microdroplet plasma",

abstract = "We demonstrate the efficient generation of extreme ultraviolet (EUV) light from laser-produced plasma (LPP) driven by 2 μm wavelength laser light as an alternative for 10 μm CO2 gas LPP currently employed in EUV lithography machines for high-volume manufacturing of semiconductor devices. High conversion efficiencies of laser light into “in-band” EUV photons up to 5.0% are achieved by homogeneously heating the plasma that is laser-generated from preshaped tin microdroplet targets. Scaling the laser pulse duration, spot size, and intensity yields a high in-band EUV energy output of up to 12.5 mJ. The EUV emission source size is studied under a similar parameter range and is shown to match typical etendues of EUV optic columns. Our findings make 2 μm LPP a particularly promising candidate to power future EUV nanolithography.",

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AU - Mostafa, Y.

AU - Behnke, L.

AU - Engels, D. J.

AU - Bouza, Z.

AU - Sheil, J.

AU - Ubachs, W.

AU - Versolato, O. O.

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PY - 2023/12/4

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N2 - We demonstrate the efficient generation of extreme ultraviolet (EUV) light from laser-produced plasma (LPP) driven by 2 μm wavelength laser light as an alternative for 10 μm CO2 gas LPP currently employed in EUV lithography machines for high-volume manufacturing of semiconductor devices. High conversion efficiencies of laser light into “in-band” EUV photons up to 5.0% are achieved by homogeneously heating the plasma that is laser-generated from preshaped tin microdroplet targets. Scaling the laser pulse duration, spot size, and intensity yields a high in-band EUV energy output of up to 12.5 mJ. The EUV emission source size is studied under a similar parameter range and is shown to match typical etendues of EUV optic columns. Our findings make 2 μm LPP a particularly promising candidate to power future EUV nanolithography.

AB - We demonstrate the efficient generation of extreme ultraviolet (EUV) light from laser-produced plasma (LPP) driven by 2 μm wavelength laser light as an alternative for 10 μm CO2 gas LPP currently employed in EUV lithography machines for high-volume manufacturing of semiconductor devices. High conversion efficiencies of laser light into “in-band” EUV photons up to 5.0% are achieved by homogeneously heating the plasma that is laser-generated from preshaped tin microdroplet targets. Scaling the laser pulse duration, spot size, and intensity yields a high in-band EUV energy output of up to 12.5 mJ. The EUV emission source size is studied under a similar parameter range and is shown to match typical etendues of EUV optic columns. Our findings make 2 μm LPP a particularly promising candidate to power future EUV nanolithography.

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JF - Applied Physics Letters

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Production of 13.5 nm light with 5% conversion efficiency from 2 μ m laser-driven tin microdroplet plasma

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