Abstract
We characterize the properties of extreme ultraviolet (EUV) light source plasmas driven by laser wavelengths in the λ laser = 1.064 - 10.6 μ m range and laser intensities of I laser = 0.5 - 5 × 10 11 W cm-2 for λ laser = 1.064 μ m. Detailed numerical simulations of laser-irradiated spherical tin microdroplet targets reveal a strong laser-wavelength dependence on laser absorptivity and the conversion efficiency of generating in-band EUV radiation. For λ laser = 1.064 μ m irradiation, the increase in in-band radiation with increasing laser intensity is offset by only a minor reduction in conversion efficiency. Radiative losses are found to dominate the power balance for all laser wavelengths and intensities, and a clear shift from kinetic to in-band radiative losses with increasing laser wavelength is identified. Yet, with increasing laser intensity, such a shift is absent. We find that the existence of a maximum conversion efficiency, near λ laser = 4 μ m, originates from the interplay between the optical depths of the laser light and the in-band EUV photons for this specific droplet-target geometry.
| Original language | English |
|---|---|
| Article number | 033301 |
| Pages (from-to) | 1-9 |
| Number of pages | 9 |
| Journal | Physics of Plasmas |
| Volume | 30 |
| Issue number | 3 |
| Early online date | 27 Mar 2023 |
| DOIs | |
| Publication status | Published - Mar 2023 |
Bibliographical note
Funding Information:We would like to thank Wim van der Zande for useful discussions. This project has received funding from the European Research Council (ERC) Starting Grant No. 802648. This work has been carried out at the Advanced Research Center for Nanolithography (ARCNL). ARCNL is a public–private partnership with founding partners UvA, VU, NWO-I, and ASML and associate partner RUG. This work made use of the Dutch national e-infrastructure with the support of the SURF Cooperative using Grant No. EINF-1043 and EINF-2947.
Funding Information:
We would like to thank Wim van der Zande for useful discussions. This project has received funding from the European Research Council (ERC) Starting Grant No. 802648. This work has been carried out at the Advanced Research Center for Nanolithography (ARCNL). ARCNL is a public–private partnership with founding partners UvA, VU, NWO-I, and ASML and associate partner RUG. This work made use of the Dutch national e-infrastructure with the support of the SURF Cooperative using Grant No. EINF-1043 and EINF-2947.
Publisher Copyright:
© 2023 Author(s).
Funding
We would like to thank Wim van der Zande for useful discussions. This project has received funding from the European Research Council (ERC) Starting Grant No. 802648. This work has been carried out at the Advanced Research Center for Nanolithography (ARCNL). ARCNL is a public–private partnership with founding partners UvA, VU, NWO-I, and ASML and associate partner RUG. This work made use of the Dutch national e-infrastructure with the support of the SURF Cooperative using Grant No. EINF-1043 and EINF-2947. We would like to thank Wim van der Zande for useful discussions. This project has received funding from the European Research Council (ERC) Starting Grant No. 802648. This work has been carried out at the Advanced Research Center for Nanolithography (ARCNL). ARCNL is a public–private partnership with founding partners UvA, VU, NWO-I, and ASML and associate partner RUG. This work made use of the Dutch national e-infrastructure with the support of the SURF Cooperative using Grant No. EINF-1043 and EINF-2947.
| Funders | Funder number |
|---|---|
| NWO-I | |
| SURF | EINF-2947, EINF-1043 |
| European Research Council | 802648 |
| ASML |
