Abstract
Laser-produced tin plasmas are used for the generation of extreme ultraviolet (EUV) light for state-of-The-Art nanolithography. Currently, CO2-gas lasers operating at 10-micrometer wavelength are used to drive the EUV-emitting plasma but with further developments regarding their output power, solid-state lasers operating at shorter, mid-infrared wavelengths may present a viable alternative. Such novel laser systems may provide a significantly higher efficiency in converting electrical power to laser light. We use an extensive diagnostic toolset to characterize and understand the physics of solid-state-laser-driven plasma light sources at the atomic level.
| Original language | English |
|---|---|
| Title of host publication | Compact EUV and X-ray Light Sources 2020 (EUVXRAY) |
| Subtitle of host publication | [Proceedings] |
| Publisher | OSA - The Optical Society |
| ISBN (Electronic) | 9781557528209 |
| ISBN (Print) | 9781943580736 |
| DOIs | |
| Publication status | Published - 2020 |
| Event | 2020 Compact EUV and X-ray Light Sources, EUVXRAY 2020 - Part of OSA High-Brightness Sources and Light-Driven Interactions Congress 2020 - Washington, United States Duration: 16 Nov 2020 → 20 Nov 2020 |
Publication series
| Name | Optics InfoBase Conference Papers |
|---|---|
| ISSN (Electronic) | 2162-2701 |
Conference
| Conference | 2020 Compact EUV and X-ray Light Sources, EUVXRAY 2020 - Part of OSA High-Brightness Sources and Light-Driven Interactions Congress 2020 |
|---|---|
| Country/Territory | United States |
| City | Washington |
| Period | 16/11/20 → 20/11/20 |
Bibliographical note
Publisher Copyright:© 2020 OSA - The Optical Society. All rights reserved.
