Spectroscopic investigations of YAG-laser-driven microdroplet-tin plasma sources of extreme ultraviolet radiation for nanolithography

O. Versolato, A. Bayerle, M. Bayraktar, L. Behnke, H. Bekker, Z. Bouza, J. Colgan, J. R. Crespo López-Urrutia, M. J. Deuzeman, R. Hoekstra, D. Kurilovich, B. Liu, R. Meijer, A. Neukirch, L. Poirier, S. Rai, A. Ryabtsev, J. Scheers, R. Schupp, J. SheilF. Torretti, W. Ubachs, S. Witte

Research output: Contribution to JournalArticleAcademicpeer-review

Abstract

Synopsis Highly charged tin ions are the sources of extreme ultraviolet (EUV) light at 13.5-nm wavelength in laser-produced transient plasmas for next-generation nanolithography. Generating this EUV light at the required power, reliability, and stability however presents a formidable task that combines industrial innovations with challenging scientific questions. We will present work on the spectroscopy of tin ions in and out of YAG-laserdriven plasma and present a surprising answer to the key question: what makes that light?

Original languageEnglish
Article number192006
Pages (from-to)1-1
Number of pages1
JournalJournal of Physics: Conference Series
Volume1412
Issue number19
DOIs
Publication statusPublished - 11 Jun 2020
Event31st International Conference on Photonic, Electronic and Atomic Collisions, ICPEAC 2019 - Deauville, France
Duration: 23 Jul 201930 Jul 2019

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