Spectroscopy for identification of plasma sources for lithography and water window imaging

G. O'Sullivan, P. Dunne, T. Higashiguchi, B. Li, R. Lokasani, E. Long, H. Ohashi, F. O'Reilly, P. Sheridan, J. Sheil, E. Sokell, C. Suzuki, T. Wu

Research output: Chapter in Book / Report / Conference proceedingConference contributionAcademicpeer-review

Abstract

© Published under licence by IOP Publishing Ltd.We report on the result of an extensive study of the extreme ultraviolet (EUV) and soft x-ray spectra from laser produced plasmas of a number of medium and high Z metals undertaken to identify potential sources for use with multilayer mirrors as sources for lithography and water window imaging and cell tomography.
Original languageEnglish
Title of host publicationXXIX International Conference on Photonic, Electronic, and Atomic Collisions, ICPEAC 2015 - Photon - Atom and Ion
EditorsL. Mendez, F. Martin, C. Diaz, G. Garcia, I. Rabadan
PublisherInstitute of Physics Publishing
DOIs
Publication statusPublished - 7 Sep 2015
Externally publishedYes
Event29th International Conference on Photonic, Electronic and Atomic Collisions, ICPEAC 2015 - Toledo, Spain
Duration: 22 Jul 201528 Jul 2015

Publication series

NameJournal of Physics: Conference Series
ISSN (Print)1742-6588
ISSN (Electronic)1742-6596

Conference

Conference29th International Conference on Photonic, Electronic and Atomic Collisions, ICPEAC 2015
Country/TerritorySpain
CityToledo
Period22/07/1528/07/15

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