Spectroscopy of highly charged ions for extreme ultraviolet lithography

G. O'Sullivan; P. Dunne; T. Higashiguchi; D. Kos; O. Maguire; T. Miyazaki; F. O'Reilly; J. Sheil; E. Sokell; D. Kilbane

doi:10.1016/j.nimb.2017.03.114

Spectroscopy of highly charged ions for extreme ultraviolet lithography

G. O'Sullivan
, P. Dunne
, T. Higashiguchi
, D. Kos
, O. Maguire
, T. Miyazaki
, F. O'Reilly
, J. Sheil
, E. Sokell
, D. Kilbane

Research output: Contribution to Journal › Article › Academic › peer-review

Abstract

© 2017 Elsevier B.V.After almost three decades of research, commercial sources for extreme ultraviolet lithography (EUVL) at 13.5 nm are now being manufactured and EUVL is expected to be introduced finally in 2018 or 2019. The source is based on laser produced plasmas (LPPs) from tin micro-droplets using double pulse irradiation in a pre-pulse/main pulse configuration. The currently accepted configuration uses a CO2 laser main pulse to minimize self-absorption in the transitions responsible for the emission at 13.5 nm. The conversion efficiency (CE) of laser to in-band EUV energy in commercial systems is currently around 4% and values up to 6% have recently been observed. However the possibility of attaining significantly higher figures has been predicted by plasma modelling and research is still ongoing to increase the CE. The present paper describes the physical processes that occur in Sn LPPs and possible routes to attaining higher CE values.

Original language	English
Pages (from-to)	3-8
Journal	Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume	408
DOIs	https://doi.org/10.1016/j.nimb.2017.03.114
Publication status	Published - 1 Oct 2017
Externally published	Yes

Funding

This work was supported by Science Foundation Ireland under Principal Investigator research Grant No. 07/IN.1/I1771 and Science Foundation Ireland International Co-operation Strategic Award 13/ISCA/2846. D. Kilbane acknowledges funding from the Irish Research Council and the Marie Curie Actions ELEVATE fellowship. JS acknowledges funding from the Irish Research Council. D. Kos is supported by the award of a fellowship by the Education, Audiovisual and Cultural Executive Agency (EACEA) Erasmus Mundus Joint Doctorate Programme Project No. 2012 – 0033. TH and TM acknowledge funding from MEXT (Ministry of Education, Culture, Science and Technology, Japan).

Funders	Funder number
FP7 People: Marie-Curie Actions
Education, Audiovisual and Culture Executive Agency	2012 – 0033
Science Foundation Ireland	07/IN.1/I1771, 13/ISCA/2846
Japan Society for the Promotion of Science	16H03902, 15H03759, 15H03570
Ministry of Education, Culture, Sports, Science and Technology
Irish Research Council

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O'Sullivan, G., Dunne, P., Higashiguchi, T., Kos, D., Maguire, O., Miyazaki, T., O'Reilly, F., Sheil, J., Sokell, E., & Kilbane, D. (2017). Spectroscopy of highly charged ions for extreme ultraviolet lithography. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 408, 3-8. https://doi.org/10.1016/j.nimb.2017.03.114

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title = "Spectroscopy of highly charged ions for extreme ultraviolet lithography",

abstract = "{\textcopyright} 2017 Elsevier B.V.After almost three decades of research, commercial sources for extreme ultraviolet lithography (EUVL) at 13.5 nm are now being manufactured and EUVL is expected to be introduced finally in 2018 or 2019. The source is based on laser produced plasmas (LPPs) from tin micro-droplets using double pulse irradiation in a pre-pulse/main pulse configuration. The currently accepted configuration uses a CO2 laser main pulse to minimize self-absorption in the transitions responsible for the emission at 13.5 nm. The conversion efficiency (CE) of laser to in-band EUV energy in commercial systems is currently around 4\% and values up to 6\% have recently been observed. However the possibility of attaining significantly higher figures has been predicted by plasma modelling and research is still ongoing to increase the CE. The present paper describes the physical processes that occur in Sn LPPs and possible routes to attaining higher CE values.",

author = "G. O'Sullivan and P. Dunne and T. Higashiguchi and D. Kos and O. Maguire and T. Miyazaki and F. O'Reilly and J. Sheil and E. Sokell and D. Kilbane",

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doi = "10.1016/j.nimb.2017.03.114",

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O'Sullivan, G, Dunne, P, Higashiguchi, T, Kos, D, Maguire, O, Miyazaki, T, O'Reilly, F, Sheil, J, Sokell, E & Kilbane, D 2017, 'Spectroscopy of highly charged ions for extreme ultraviolet lithography', Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, vol. 408, pp. 3-8. https://doi.org/10.1016/j.nimb.2017.03.114

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AU - Dunne, P.

AU - Higashiguchi, T.

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AU - Miyazaki, T.

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AU - Sheil, J.

AU - Sokell, E.

AU - Kilbane, D.

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ER -

Spectroscopy of highly charged ions for extreme ultraviolet lithography

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