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Strongly anisotropic ion emission in the expansion of Nd:YAG-laser-produced plasma

  • Lucas Poirier
  • , Diko J. Hemminga
  • , Adam Lassise
  • , Luc Assink
  • , Ronnie Hoekstra
  • , John Sheil
  • , Oscar O. Versolato*
  • *Corresponding author for this work

Research output: Contribution to JournalArticleAcademicpeer-review

Abstract

We present results from a combined experimental and numerical simulation study of the anisotropy of the expansion of a laser-produced plasma into vacuum. Plasma is generated by nanosecond Nd:YAG laser pulse impact (laser wavelength λ = 1.064 μ m) onto tin microdroplets. Simultaneous measurements of ion kinetic energy distributions at seven angles with respect to the direction of the laser beam reveal strong anisotropic emission characteristics, in close agreement with the predictions of two-dimensional radiation-hydrodynamic simulations. Angle-resolved ion spectral measurements are further shown to provide an accurate prediction of the plasma propulsion of the laser-impacted droplet.

Original languageEnglish
Article number123102
Pages (from-to)1-11
Number of pages11
JournalPhysics of Plasmas
Volume29
Issue number12
Early online date5 Dec 2022
DOIs
Publication statusPublished - Dec 2022

Bibliographical note

Funding Information:
The authors thank Duncan Verheijde for his support in understanding and improving the RFA electronics. They also thank Jorijn Kuster for designing efficient and user-friendly software interfaces for the experimental setups and Bo Liu and Randy Meijer for useful discussions. This work has been carried out at the Advanced Research Center for Nanolithography (ARCNL). ARCNL is public–private partnership with founding partners UvA, VU, NWO-I, and ASML and associate partner RUG. This project has received funding from European Research Council (ERC) Starting Grant No. 802648. This work made use of the Dutch National e-Infrastructure with the support of the SURF Cooperative using Grant No. EINF-2947.

Publisher Copyright:
© 2022 Author(s).

Funding

The authors thank Duncan Verheijde for his support in understanding and improving the RFA electronics. They also thank Jorijn Kuster for designing efficient and user-friendly software interfaces for the experimental setups and Bo Liu and Randy Meijer for useful discussions. This work has been carried out at the Advanced Research Center for Nanolithography (ARCNL). ARCNL is public–private partnership with founding partners UvA, VU, NWO-I, and ASML and associate partner RUG. This project has received funding from European Research Council (ERC) Starting Grant No. 802648. This work made use of the Dutch National e-Infrastructure with the support of the SURF Cooperative using Grant No. EINF-2947.

FundersFunder number
European Research Council
Horizon 2020 Framework Programme802648
SURFEINF-2947

    UN SDGs

    This output contributes to the following UN Sustainable Development Goals (SDGs)

    1. SDG 7 - Affordable and Clean Energy
      SDG 7 Affordable and Clean Energy

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