Tailoring spatial entropy in extreme ultraviolet focused beams for multispectral ptychography

Xiaomeng Liu, Lars Loetgering, Anne de Beurs, Mengqi Du, Patrick Konold, Kjeld Eikema, Stefan Witte*

*Corresponding author for this work

Research output: Chapter in Book / Report / Conference proceedingConference contributionAcademicpeer-review

Abstract

We demonstrate a computational approach to designing diffractive optical elements (DOEs) that can be used to focus multispectral extreme-ultraviolet radiation from a high-harmonic generation source. The polychromatic focusing properties are experimentally confirmed using ptychography.

Original languageEnglish
Title of host publicationComputational Optical Sensing and Imaging 2021 (COSI)
PublisherOSA - The Optical Society
ISBN (Print)9781943580897
Publication statusPublished - Jul 2021
EventComputational Optical Sensing and Imaging, COSI 2021 - Part of OSA Imaging and Applied Optics Congress 2021 - Virtual, Online, United States
Duration: 19 Jul 202123 Jul 2021

Publication series

NameOptics InfoBase Conference Papers

Conference

ConferenceComputational Optical Sensing and Imaging, COSI 2021 - Part of OSA Imaging and Applied Optics Congress 2021
Country/TerritoryUnited States
CityVirtual, Online
Period19/07/2123/07/21

Bibliographical note

Publisher Copyright:
© OSA 2021, © 2021 The Author(s)

Fingerprint

Dive into the research topics of 'Tailoring spatial entropy in extreme ultraviolet focused beams for multispectral ptychography'. Together they form a unique fingerprint.

Cite this