Theoretical and experimental demonstration of a state-of-the-art dark-field holographic microscope for advanced semiconductor metrology

C. Messinis*, V. T. Tenner, J. F. de Boer, S. Witte, A. J. den Boef

*Corresponding author for this work

Research output: Chapter in Book / Report / Conference proceedingConference contributionAcademicpeer-review

Abstract

We describe a dark-field holographic microscope, that aims to surpass metrology requirements with novel phase-DBO measurements. We present parameters that improve overlay (OV) metrology and test the validation of our analysis with an experimental demonstration.

Original languageEnglish
Title of host publicationImaging and Applied Optics 2019 (COSI, IS, MATH, pcAOP)
Subtitle of host publication[Proceedings]
PublisherOSA - The Optical Society
ISBN (Electronic)9781557528209
DOIs
Publication statusPublished - Jun 2019
EventComputational Optical Sensing and Imaging, COSI 2019 - Munich, Germany
Duration: 24 Jun 201927 Jun 2019

Publication series

NameOptics InfoBase Conference Papers
VolumePart F170-COSI 2019

Conference

ConferenceComputational Optical Sensing and Imaging, COSI 2019
Country/TerritoryGermany
CityMunich
Period24/06/1927/06/19

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