TI-REX: A Tunable Infrared laser for Experiments in nanolithography

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Abstract

In a world where miniaturization leads technology advancement, extreme ultraviolet (EUV) light is becoming the tool for leading companies to increase the number of transistors on a chip. EUV light is generated via laser-produced plasma (LPP), that is currently driven by 10.6 m CO 2 lasers, due to their high demonstrated conversion efficiency (CE) from laser power to EUV. In terms of laser technology, solid-state lasers based on Nd:YAG, operating around 1m wavelength have significant advantages in terms of efficiency, stability and control over temporal pulse shape and contrast. However, so far they provide lower CE than CO 2 lasers [1] , even though advanced pulse temporal shaping seems advantageous in this regard. A promising avenue is the investigation of the intermediate wavelength regime: first data for 2 m lasers already indicates a CE improvement compared to 1m [2] , and simulations predict even better performances for wavelengths between 2 and 10 m.

Original languageEnglish
Title of host publication2021 Conference on Lasers and Electro-Optics Europe and European Quantum Electronics Conference (CLEO/Europe-EQEC)
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781665418768
DOIs
Publication statusPublished - 30 Sep 2021
Event2021 Conference on Lasers and Electro-Optics Europe and European Quantum Electronics Conference, CLEO/Europe-EQEC 2021 - Munich, Germany
Duration: 21 Jun 202125 Jun 2021

Conference

Conference2021 Conference on Lasers and Electro-Optics Europe and European Quantum Electronics Conference, CLEO/Europe-EQEC 2021
Country/TerritoryGermany
CityMunich
Period21/06/2125/06/21

Bibliographical note

Publisher Copyright:
© 2021 IEEE.

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