TY - JOUR
T1 - Total reflection PIXE (TPIXE) and RBS for surface and trace element analysis.
AU - van Kan, J.A.
AU - Vis, R.D.
PY - 1996
Y1 - 1996
N2 - MeV proton and α beams at small incident angles (0-35 mrad) were used to analyse flat surfaces such as Si wafers and coated quartz substrates. X-rays and backscattered particles were detected in a total reflection geometry. Using TPIXE a quick and simultaneous detection of different trace elements was established. At very small incident angles of a few mrad, it was observed that the RBS yield drops faster than the X-ray yield, which indicates surface channelling.
AB - MeV proton and α beams at small incident angles (0-35 mrad) were used to analyse flat surfaces such as Si wafers and coated quartz substrates. X-rays and backscattered particles were detected in a total reflection geometry. Using TPIXE a quick and simultaneous detection of different trace elements was established. At very small incident angles of a few mrad, it was observed that the RBS yield drops faster than the X-ray yield, which indicates surface channelling.
U2 - 10.1016/0168-583X(95)00890-X
DO - 10.1016/0168-583X(95)00890-X
M3 - Article
SN - 0168-583X
VL - 109-110
SP - 85
JO - Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
JF - Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
ER -
